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公开(公告)号：US20190227393A1
公开(公告)日：2019-07-25
申请号：US15777829
申请日：2017-10-09
Inventor： Bingqiang GUI , Lianjie Qu , Yonglian QI , Hebin ZHAO , Yun QIU
IPC: G02F1/1343 , H01L27/12 , G02F1/1362 , G02F1/1368 , G03F7/16 , G03F7/20 , G03F7/26
Abstract: An array substrate and a manufacturing method thereof, and display panel are disclosed. The array substrate includes a substrate, a thin film transistor disposed on the substrate and a common electrode disposed on a side of the thin film transistor away from the substrate. The common electrode includes a first hollowed-out portion. An active layer of the thin film transistor includes a source electrode region, a drain electrode region and a channel region. An orthographic projection of the first hollowed-out portion on the substrate at least covers an orthographic projection of the channel region on the substrate.
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22.发明申请公开(公告)号：US20190196063A1
公开(公告)日：2019-06-27
申请号：US16329957
申请日：2018-05-23
Inventor： Bingqiang GUI , Lianjie QU , Yonglian QI , Meili WANG , Hebin ZHAO , Yun QIU
IPC: G02B1/11 , G02B1/14 , G02F1/1335
CPC classification number: G02B1/11 , G02B1/14 , G02F1/133502
Abstract: An anti-reflection structure, a display device and a fabrication method for the anti-reflection structure are provided. The anti-reflection structure comprises a substrate, a first microstructure and a second microstructure. The first microstructure comprises a plurality of first microstructure units periodically arranged on the substrate, a second microstructure is filled between the first microstructures so as to cover the substrate, and the anti-reflection structure has a flat surface. The refractive indices of the first microstructure and the second microstructure are different and are configured such that overall, the reflectivity of the anti-reflection structure to light of a predetermined wavelength is lower than the reflectivity of the substrate to light of the predetermined wavelength.
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公开(公告)号：US20190041746A1
公开(公告)日：2019-02-07
申请号：US15941920
申请日：2018-03-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO , Yun QIU
Abstract: The present disclosure proposes a manufacturing method for a metal grating, a metal grating, and a display device. The manufacturing method comprises: forming a metal layer, an antireflective layer and a deep UV photoresist layer sequentially on a base substrate; etching the deep UV photoresist layer by a photolithography process, so as to form a grating mask pattern; etching the antireflective layer by a dry etching process with the help of the grating mask pattern, so as to form an etch mask pattern identical to the grating mask pattern; peeling off the grating mask pattern; etching the metal layer by a dry etching process with the help of the etch mask pattern, so as to form metal grating strips; and removing the etch mask pattern, thus forming a metal grating.
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公开(公告)号：US20190013362A1
公开(公告)日：2019-01-10
申请号：US15745008
申请日：2017-06-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO
Abstract: A display substrate, a manufacture method thereof and a display panel are provided. The display substrate includes: a first substrate; a plurality of pixel units included in the first substrate, each of the pixel units at least including a first sub-pixel unit, a second sub-pixel unit and a third sub-pixel unit; a medium film laminated layer arranged on the first substrate, the medium film laminated layer at least covering the first sub-pixel unit and the second sub-pixel unit; the medium film laminated layer is configured to eliminate blue light in a first wavelength range passing the medium film laminated layer, the medium film laminated layer includes at least one first medium film layer and at least one second medium film layer which are laminated alternately, and a refractive index of the first medium film layer is greater than a refractive index of the second medium film layer.
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25.发明申请公开(公告)号：US20190006428A1
公开(公告)日：2019-01-03
申请号：US15735974
申请日：2017-06-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO
CPC classification number: H01L27/322 , H01L51/5253 , H01L51/5284 , H01L51/56
Abstract: An OLED display panel, a fabricating method, and a display apparatus are disclosed. The OLED display panel includes a base substrate; an anode layer, a cathode layer and an organic light emitting layer between the anode layer and the cathode layer arranged on the base substrate, the organic light emitting layer being configured to emit light having third color; and first light emitting unit, second light emitting unit and third light emitting unit arranged on a light emitting side of the organic light emitting layer and independent from each other, and configured to emit, under the action of the light having the third color, light having a first color, light having a second color and light having the third color, respectively, the light having the first color, the light having the second color and the light having the third color being configured to generate white light when being mixed.
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Patent Agency Ranking
公开(公告)号：US20190006195A1
公开(公告)日：2019-01-03
申请号：US15951267
申请日：2018-04-12
Inventor： Lianjie QU , Yun QIU , Dan WANG , Hebin ZHAO
Abstract: A chip encapsulating method includes: fixing a plurality of wafers to a first panel level substrate, the wafer including a plurality of chips; forming a re-distribution layer on the wafer for each of the chips; forming each individual chip and the re-distribution layer connected to the chip by cutting; fixing the chip and the re-distribution layer connected thereto to a second panel level substrate; and encapsulating the chip to form an encapsulating layer. A chip encapsulating structure is prepared by the above described chip encapsulating method.
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公开(公告)号：US20220037198A1
公开(公告)日：2022-02-03
申请号：US17278855
申请日：2020-07-24
Inventor： Shan ZHANG , Lianjie QU , Yonglian QI , Hebin ZHAO
IPC: H01L21/762 , H01L27/12 , H01L29/66 , H01L29/786 , H01L21/683
Abstract: A method of manufacturing thin film transistor(s) includes: providing a monocrystalline silicon wafer, the monocrystalline silicon wafer including a first surface and a second surface that are opposite to each other; forming a bubble layer between the first surface and the second surface of the monocrystalline silicon wafer, the bubble layer dividing the monocrystalline silicon wafer into two portions arranged side by side in a direction perpendicular to the second surface, and a portion of the monocrystalline silicon wafer that is located between the bubble layer and the second surface being a monocrystalline silicon film having a target thickness; providing a substrate, and transferring the monocrystalline silicon film onto the substrate by breaking the monocrystalline silicon wafer at the bubble layer; and patterning the monocrystalline silicon film transferred to the substrate to form active layer(s) of the thin film transistor(s).
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公开(公告)号：US20210271131A1
公开(公告)日：2021-09-02
申请号：US16301171
申请日：2018-02-12
Inventor： Weipin HU , Hebin ZHAO , Xiao SUN
IPC: G02F1/1335 , G02C11/00 , G02C7/12
Abstract: A display panel, a manufacturing method thereof and a display system. The display panel includes: an opposite substrate and an array substrate that are opposite to each other, a liquid crystal layer between the opposite substrate and the array substrate, and a reflective polarizer on the opposite substrate, wherein the reflective polarizer is on a side of the liquid crystal layer away from the array substrate.
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公开(公告)号：US20210202899A1
公开(公告)日：2021-07-01
申请号：US17058114
申请日：2020-04-20
Inventor： Yonglian QI , Lianjie QU , Shan ZHANG , Hebin ZHAO , Xiaoling XU , Guangdong SHI , Zhiyong LIU
Abstract: An OLED display screen, a display panel and a manufacturing method thereof are disclosed in the present disclosure, the method includes: fabricating a TFT array substrate and an OLED component on a substrate, where the OLED component includes a first electrode, a light-emitting layer, and a second electrode; and fabricating a first organic layer on a side of the second electrode away from the substrate, where the first organic layer is capable of chemically reacting with the second electrode.
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公开(公告)号：US20210193687A1
公开(公告)日：2021-06-24
申请号：US17040510
申请日：2020-03-18
Inventor： Yonglian QI , Chao LIU , Lianjie QU , Hebin ZHAO , Shan ZHANG , Ning JIA , Guangdong SHI , Shuai LIU
IPC: H01L27/12 , H01L25/075
Abstract: A method of forming an array substrate, the array substrate and a display device are provided. The method of forming the array substrate includes: in a case that a display unit is formed on one of two opposite surfaces of a base substrate and a driving circuit is formed on the other of the two opposite surfaces of the base substrate, performing a roughening treatment on edge regions of the two opposite surfaces of the base substrate and a side surface of the base substrate connecting the edge regions of the two opposite surfaces, to form a roughened region; and forming, at the roughened region, a metal wiring connecting a signal input terminal of the display unit and a signal output terminal of the driving circuit.
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