公开(公告)号：US20220057323A1

公开(公告)日：2022-02-24

申请号：US16996579

申请日：2020-08-18

Applicant: Applied Materials, Inc.

Inventor： Todd J. Egan ,  Avishek Ghosh ,  Edward W. Budiarto ,  Guoheng Zhao

IPC: G01N21/41 ,  G01P13/00 ,  G01B11/06 ,  G01B11/30

Abstract: Implementations disclosed describe an optical inspection device comprising a source of light to direct a light beam to a location on a surface of a wafer, the wafer being transported from a processing chamber, wherein the light beam is to generate, a reflected light, an optical sensor to collect a first data representative of a direction of the first reflected light, collect a second data representative of a plurality of values characterizing intensity of the reflected light at a corresponding one of a plurality of wavelengths, and a processing device, in communication with the optical sensor, to determine, using the first data, a position of the surface of the wafer; retrieve calibration data, and determine, using the position of the surface of the wafer, the second data, and the calibration data, a characteristic representative of a quality of the wafer.

公开(公告)号：US11226234B2

公开(公告)日：2022-01-18

申请号：US16749168

申请日：2020-01-22

Applicant: Applied Materials, Inc.

Inventor： Guoheng Zhao ,  Edward W. Budiarto ,  Todd J. Egan

IPC: G01J3/28 ,  G01J3/14 ,  G02B6/293 ,  G01J3/02

Abstract: Implementations disclosed describe a system comprising a first optical device to receive an input beam of light, the input beam having a plurality of spectral components of light, and cause the input beam to disperse into a plurality of spectral beams, wherein each of the plurality of spectral beams corresponds to one of the plurality of spectral components and propagates along a spatial path that is different from spatial paths of other spectral beams, and a second optical device to collect a portion of each of the spectral beams, wherein the collected portion depends on the spatial path of the respective spectral beam, and form an output beam of light from the collected portion of each of the spectral beams, wherein a spectral profile of the output beam is different from a spectral profile of the input beam of light.

公开(公告)号：US11187654B2

公开(公告)日：2021-11-30

申请号：US16944946

申请日：2020-07-31

Applicant: Applied Materials, Inc.

Inventor： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Todd J. Egan

IPC: G01N21/55

Abstract: An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.

公开(公告)号：US20210366143A1

公开(公告)日：2021-11-25

申请号：US16877866

申请日：2020-05-19

Applicant: Applied Materials, Inc.

Inventor： Mehdi Vaez-Iravani ,  Guoheng Zhao

IPC: G06T7/68 ,  G06T7/00

Abstract: Methods for detecting areas of localized tilt on a sample using imaging reflectometry measurements include obtaining a first image without blocking any light reflected from the sample and obtaining a second image while blocking some light reflected from the sample at the aperture plane. The areas of localized tilt are detected by comparing first reflectance intensity values of pixels in the first image with second reflectance intensity values of corresponding pixels in the second image.

公开(公告)号：US11908716B2

公开(公告)日：2024-02-20

申请号：US17321366

申请日：2021-05-14

Applicant: Applied Materials, Inc.

Inventor： Guoheng Zhao ,  Venkatakaushik Voleti ,  Todd Egan ,  Kyle R. Tantiwong ,  Andreas Schulze ,  Niranjan Ramchandra Khasgiwale ,  Mehdi Vaez-Iravani

IPC: H01L21/67 ,  C23C16/52 ,  G01N21/55 ,  H01L21/66

CPC classification number: H01L21/67253 ,  C23C16/52 ,  G01N21/55 ,  H01L21/67069 ,  H01L22/12

Abstract: Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

公开(公告)号：US11442000B2

公开(公告)日：2022-09-13

申请号：US16716218

申请日：2019-12-16

Applicant: Applied Materials, Inc.

Inventor： Mehdi Vaez-Iravani ,  Sankesha Bhoyar ,  Rachit Sharma ,  Guoheng Zhao

IPC: G01N15/14

Abstract: Examples disclosed herein generally relate to an apparatus and method for detecting particles in a fluid. A system for imaging a particle includes an imaging device. The imaging device has a lens and a detector. A laser source is configured to emit a laser beam. The detector is configured to accumulate an intensity of an accumulated light that passes through the lens. The accumulated light is scattered by the particle. The particle passes through the laser beam over a given period.

公开(公告)号：US20210223102A1

公开(公告)日：2021-07-22

申请号：US16749168

申请日：2020-01-22

Applicant: Applied Materials, Inc.

Inventor： Guoheng Zhao ,  Edward W. Budiarto ,  Todd J. Egan

IPC: G01J3/28 ,  G01J3/14 ,  G01J3/02 ,  G02B6/293

Abstract: Implementations disclosed describe a system comprising a first optical device to receive an input beam of light, the input beam having a plurality of spectral components of light, and cause the input beam to disperse into a plurality of spectral beams, wherein each of the plurality of spectral beams corresponds to one of the plurality of spectral components and propagates along a spatial path that is different from spatial paths of other spectral beams, and a second optical device to collect a portion of each of the spectral beams, wherein the collected portion depends on the spatial path of the respective spectral beam, and form an output beam of light from the collected portion of each of the spectral beams, wherein a spectral profile of the output beam is different from a spectral profile of the input beam of light.

公开(公告)号：US20200232916A1

公开(公告)日：2020-07-23

申请号：US16295173

申请日：2019-03-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Todd J. Egan

IPC: G01N21/55

Abstract: An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.