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    Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer
    21.
    发明授权
    Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer 失效
    基于近红外光谱仪控制金属层蚀刻工艺和金属层蚀刻工艺再生蚀刻剂的方法

    公开(公告)号：US07112795B2

    公开(公告)日：2006-09-26

    申请号：US10276703

    申请日：2001-03-27

    Applicant: Ki-Beom Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Byung-Uk Kim ,  Chang-Il Oh

    Inventor： Ki-Beom Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Byung-Uk Kim ,  Chang-Il Oh

    IPC: G01J5/02

    CPC classification number: G01N21/359 ,  C23F1/00 ,  C23F1/46 ,  G01N21/3577 ,  G11B23/505 ,  H01L21/32134

    Abstract: In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

    Abstract translation: 在控制用于制造半导体器件或液晶显示器件的金属层蚀刻工艺的方法中，首先用NIR光谱仪分析用于蚀刻金属层的蚀刻剂的组成。 然后通过将分析的组合物与参考组合物进行比较来确定蚀刻剂的状态。 如果蚀刻剂的使用寿命终止，蚀刻剂将被新的蚀刻剂所取代。 相比之下，在蚀刻剂的寿命被遗留的情况下，蚀刻剂被输送到下一个金属层蚀刻工艺。 该分析技术可以以类似的方式应用于蚀刻剂再生过程。

    System for testing a flat panel display device and method thereof
    27.
    发明授权
    System for testing a flat panel display device and method thereof 有权
    用于测试平板显示装置的系统及其方法

    公开(公告)号：US07859274B2

    公开(公告)日：2010-12-28

    申请号：US12279066

    申请日：2007-02-15

    Applicant: Byung-Uk Kim ,  Ki-Beom Lee ,  Yong-Woo Kim ,  Mi-Sun Park ,  Jin-Sup Hong ,  Wy-Yong Kim

    Inventor： Byung-Uk Kim ,  Ki-Beom Lee ,  Yong-Woo Kim ,  Mi-Sun Park ,  Jin-Sup Hong ,  Wy-Yong Kim

    IPC: G01R31/302 ,  G01R31/305 ,  G01R31/28

    CPC classification number: G02F1/1309

    Abstract: A system for testing a flat panel display having a flat display panel assembly includes a testing stage for arranging the flat display panel assembly, a measuring apparatus being disposed on the testing stage and for measuring a spectrum of a transmitted light passing through a measuring region of the flat display panel assembly from a light source, a transporting apparatus for moving the measuring apparatus at a constant acceleration on the testing stage, a defect informing apparatus being electrically connected to the measuring apparatus and for informing an existence of defect, a type of defect, and a severity of defect by processing an electrical signal of the spectrum transmitted from the measuring apparatus.

    Abstract translation: 一种用于测试具有平面显示面板组件的平板显示器的系统，包括：用于布置平面显示面板组件的测试台;测量装置，设置在测试台上，并用于测量通过测量区域的测量区域的透射光谱; 来自光源的平面显示面板组件，用于在测试台上以恒定加速度移动测量装置的传送装置，与测量装置电连接并用于通知缺陷的存在的缺陷通知装置，缺陷的类型 以及通过处理从测量装置发送的频谱的电信号的缺陷的严重性。

    Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
    30.
    发明授权
    Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same 有权
    光刻胶组合物，使用其的薄膜构图方法，以及使用其制造液晶显示面板的方法

    公开(公告)号：US07713677B2

    公开(公告)日：2010-05-11

    申请号：US11562714

    申请日：2006-11-22

    Applicant: Hi Kuk Lee ,  Byung Uk Kim ,  Hyoc Min Youn ,  Joo Pyo Yun ,  Woo Seok Jeon

    Inventor： Hi Kuk Lee ,  Byung Uk Kim ,  Hyoc Min Youn ,  Joo Pyo Yun ,  Woo Seok Jeon

    IPC: G03F7/00 ,  G03F7/004

    CPC classification number: G03F7/0392 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118

    Abstract: A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.

    Abstract translation: 能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂 为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中， 前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R1， R2和R3相同或不同，为氢或叔丁基乙烯基醚保护基。

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