公开(公告)号：US10964578B2

公开(公告)日：2021-03-30

申请号：US16401792

申请日：2019-05-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jung Mo Sung ,  Jong Woo Sun ,  Je Woo Han ,  Chan Hoon Park ,  Seung Yoon Song ,  Seul Ha Myung

IPC: H01L21/683 ,  H01L21/67

Abstract: A semiconductor processing apparatus includes a chamber housing, an electrostatic chuck disposed in the chamber housing, the electrostatic chuck being configured to hold a semiconductor wafer, an edge ring surrounding the electrostatic chuck, the edge ring including a ring electrode disposed within the edge ring, and a ring voltage supply configured to supply a ring voltage to the ring electrode, the ring voltage having a non-sinusoidal periodic waveform, wherein each period of the non-sinusoidal periodic waveform comprises a positive voltage applied during a first time period and a negative voltage applied during a second time period, and wherein the negative voltage has a magnitude that increases during the second time period.

公开(公告)号：US10748749B1

公开(公告)日：2020-08-18

申请号：US16668825

申请日：2019-10-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeong Il Mun ,  Kyeong Hun Kim ,  See Yub Yang ,  Hyung Joo Lee ,  Jong Woo Sun

IPC: H01J37/32 ,  G01N21/00 ,  G01N21/68 ,  G01N21/62

Abstract: A plasma monitoring apparatus includes a reflective structure disposed on a processing chamber providing a space in which plasma for processing a substrate is formed, the reflective structure configured to receive fragments of light incident in a plurality of incident directions from the plasma, and output the fragments of light in a plurality of exit directions by reflecting the fragments of light within the reflective structure; at least one light sensor configured to receive the fragments of light passing through the reflective structure in the plurality of exit directions; and at least one optical spectrometer connected to the at least one light sensor.