EUV light generator including collecting mirror having drip hole

    公开(公告)号:US10401602B2

    公开(公告)日:2019-09-03

    申请号:US15172390

    申请日:2016-06-03

    Abstract: An extreme ultraviolet (EUV) light generator includes a collecting mirror having a first focal point and a second focal point, the first focal point being closer to the collecting mirror than the second focal point, a laser to generate a laser beam and to radiate the laser beam toward the first focal point of the collecting mirror, and a droplet generator to generate a droplet and to discharge the droplet at the first focal point of the collecting mirror, wherein the collecting mirror includes a concave reflective surface, a through hole in a center of the reflective surface, and a drip hole between the through hole and an outer circumferential surface of the reflective surface.

    Extreme ultraviolet light source devices
    14.
    发明授权
    Extreme ultraviolet light source devices 有权
    极紫外光源设备

    公开(公告)号:US09078334B2

    公开(公告)日:2015-07-07

    申请号:US14105654

    申请日:2013-12-13

    CPC classification number: H05G2/006 G03F7/70916 H05G2/008

    Abstract: An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.

    Abstract translation: 公开了一种极紫外光(EUL)源装置,该装置包括:设置有气流和液滴流的室; 目标材料通过该液滴发生器变成液滴流; 以及沿着液滴流定位的护罩,所述护罩屏蔽来自所述气流的液滴流,其中所述液滴流被激光照射以产生等离子体并产生极紫外光。 护罩包括引导表面特征,其引导累积的目标材料远离反射和聚焦EUL的收集器反射镜。

Patent Agency Ranking