LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME
    11.
    发明申请
    LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME 有权
    液晶显示器及其制造方法

    公开(公告)号:US20140002764A1

    公开(公告)日:2014-01-02

    申请号:US13687542

    申请日:2012-11-28

    Abstract: A display device includes a substrate, a thin film transistor disposed on the substrate, where the thin film transistor includes a drain electrode, a passivation layer disposed on the substrate covering the thin film transistor, a common electrode disposed on the passivation layer, where the common electrode receives a common voltage, a liquid crystal layer disposed in a microcavity layer on the common electrode, a roof layer disposed covering the liquid crystal layer, and a pixel electrode disposed on the roof layer, and a method of manufacturing the display device is provided.

    Abstract translation: 显示装置包括基板,设置在基板上的薄膜晶体管,薄膜晶体管包括漏电极,设置在覆盖薄膜晶体管的基板上的钝化层,设置在钝化层上的公共电极, 公共电极接收公共电压,设置在公共电极上的微腔层中的液晶层,覆盖液晶层的屋顶层和设置在屋顶层上的像素电极,以及制造显示装置的方法 提供。

    DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20250089522A1

    公开(公告)日:2025-03-13

    申请号:US18624524

    申请日:2024-04-02

    Abstract: A display device includes a display panel including a pressed area, a non-pressed area, and an alignment mark area defined on a rear surface overlapping the pressed area, a driving chip disposed on a front surface of the display panel overlapping the pressed area, and a cover panel disposed on the rear surface of the display panel. The cover panel includes a first functional layer disposed on the rear surface of the display panel overlapping the non-pressed area, a second functional layer disposed on the first functional layer, extending along the first functional layer, and disposed on the rear surface of the display panel overlapping the pressed area, and a third functional layer disposed on the second functional layer overlapping the pressed area.

    DEPOSITION APPARATUS AND DEPOSITION METHOD
    15.
    发明申请
    DEPOSITION APPARATUS AND DEPOSITION METHOD 审中-公开
    沉积装置和沉积方法

    公开(公告)号:US20150184289A1

    公开(公告)日:2015-07-02

    申请号:US14468042

    申请日:2014-08-25

    CPC classification number: C23C16/52 C23C16/45536 C23C16/45551

    Abstract: An apparatus may be used for forming a material layer on a substrate. The apparatus may include a reactor that includes a supply unit set configured to supply a material to the substrate. The apparatus may further include a control mechanism configured to control whether the material is provided to the supply unit set according to a position of the substrate with respect to the reactor.

    Abstract translation: 可以使用一种装置在衬底上形成材料层。 该装置可以包括反应器,其包括被配置为将材料供应到基板的供应单元组。 该装置还可以包括控制机构,该控制机构被配置为根据基板相对于反应器的位置来控制材料是否被提供给供应单元组。

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