公开(公告)号：US20140315134A1

公开(公告)日：2014-10-23

申请号：US14072272

申请日：2013-11-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun Sung BANG ,  Won Jong KIM ,  Ji Young CHOUNG ,  Joon Gu LEE ,  Jin Baek CHOI ,  Yeon Hwa LEE

IPC: G03F7/00

CPC classification number: G03F7/0035 ,  H01L21/0272

Abstract: In a method and apparatus for manufacturing a donor substrate, a pattern layer which exposes a surface of a substrate is arranged on the substrate, and an organic material is deposited on the exposed surface of the substrate. The pattern layer includes a film pattern that defines a plurality of first openings and a photoresist pattern that is positioned on the film pattern and defines second openings, which correspond to the first openings, respectively, a minimum width of the second openings being smaller than that of the first openings.

Abstract translation: 在用于制造施主衬底的方法和装置中，在衬底上布置暴露衬底表面的图案层，并且在衬底的暴露表面上沉积有机材料。 图案层包括限定多个第一开口的膜图案和位于膜图案上并分别对应于第一开口的第二开口的光致抗蚀剂图案，第二开口的最小宽度小于第二开口的最小宽度 的第一个开口。