公开(公告)号：US20160054660A1

公开(公告)日：2016-02-25

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03F7/20 ,  H01L27/12 ,  H01L29/786

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。