Abstract:
A method of manufacturing an organic light-emitting display includes a first mask process forming an active layer of a TFT and a refractive layer on a substrate, forming a DBR layer covering the active and refractive layers, a second mask process forming a gate electrode and a first electrode unit on the DBR layer, forming an interlayer insulation layer covering the gate electrode and the first electrode unit, a third mask process forming contact holes in the interlayer insulation layer and the DBR layer exposing portions of the active layer and a hole exposing the first electrode unit, a fourth mask process forming source and drain electrodes on the interlayer insulation layer that contact the active layer via the contact holes, and forming a pixel electrode from the first electrode unit, and a fifth mask process forming a pixel definition layer exposing the pixel electrode.
Abstract:
A method of fabricating an electronic apparatus including the steps of forming a circuit element on a base substrate, forming a signal line on the base substrate, forming a first insulating layer covering the circuit element and the signal line, forming a display device layer including a light-emitting device on the first insulating layer, forming a first conductive layer on the display device layer, forming a second insulating layer covering the first insulating layer and the first conductive layer, forming a first contact hole penetrating the first and second insulating layers in a first region overlapping with the first conductive layer, forming a second contact hole penetrating the first and second insulating layers in a second region overlapping with an end portion of the signal line, forming a second conductive layer overlapping with the first region, and forming a pad overlapping with the second region.
Abstract:
An organic light-emitting display apparatus includes a substrate including a plurality of red, green, and blue sub-pixel regions, a pixel electrode in each of the plurality of the red, green, and blue sub-pixel regions on the substrate, a Distributed Bragg Reflector (DBR) layer between the substrate and the pixel electrodes, a high-refractive index layer between the substrate and the DBR layer in the blue sub-pixel region, the high-refractive index layer having a smaller area than an area of a corresponding pixel electrode in the blue sub-pixel region, an intermediate layer including an emissive layer on the pixel electrode, and an opposite electrode on the intermediate layer.
Abstract:
An organic light emitting diode (OLED) display device and a method of fabricating the same are provided. The OLED display device includes a substrate having a thin film transistor region and a capacitor region, a buffer layer disposed on the substrate, a gate insulating layer disposed on the substrate, a lower capacitor electrode disposed on the gate insulating layer in the capacitor region, an interlayer insulating layer disposed on the substrate, and an upper capacitor electrode disposed on the interlayer insulating layer and facing the lower capacitor electrode, wherein regions of each of the buffer layer, the gate insulating layer, the interlayer insulating layer, the lower capacitor electrode, and the upper capacitor electrode have surfaces in which protrusions having the same shape as grain boundaries of the semiconductor layer are formed. The resultant capacitor has an increased surface area, and therefore, an increased capacitance.