DEPOSITION APPARATUS
    11.
    发明申请

    公开(公告)号:US20180126413A1

    公开(公告)日:2018-05-10

    申请号:US15865679

    申请日:2018-01-09

    CPC classification number: B05D1/60 C23C14/24 H01L51/001

    Abstract: A deposition apparatus includes an effusion cell, a guide rail, and a cooling channel. The effusion cell extends in a first direction. The guide rail is below the effusion cell and extends in a second direction. The cooling channel is below an upper surface of the guide rail and extends in the second direction.

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