VAPOR DEPOSITION APPARATUS
    11.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开
    蒸气沉积装置

    公开(公告)号:US20150034008A1

    公开(公告)日:2015-02-05

    申请号:US14183963

    申请日:2014-02-19

    Abstract: Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle.

    Abstract translation: 本发明提供一种蒸镀装置,其特征在于,包括具有彼此平行配置的多个沉积模块的沉积单元和位于所述沉积单元的下方的基板安装单元,基板安装在所述沉积单元上。 在这种情况下,多个沉积模块中的每一个都包括一个喷嘴,该喷嘴构造成选择性地将原料气体和净化气体朝向基板安装单元喷射,并且喷嘴在基板安装单元位于喷嘴下方时喷射原料气体。

Patent Agency Ranking