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    Process for producing silica glass plate having controlled refractive index distribution
    14.
    发明授权
    Process for producing silica glass plate having controlled refractive index distribution 失效
    具有受控折射率分布的石英玻璃板的制造方法

    公开(公告)号：US5160358A

    公开(公告)日：1992-11-03

    申请号：US692457

    申请日：1991-04-17

    Applicant: Osamu Kondo ,  Masukazu Hirata ,  Mitsuzo Arii

    Inventor： Osamu Kondo ,  Masukazu Hirata ,  Mitsuzo Arii

    IPC: C03B19/12 ,  C03B37/016 ,  C03C23/00

    CPC classification number: C03B37/016 ,  C03B19/12 ,  C03C23/0095 ,  C03B2201/10 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/54 ,  C03B2203/22 ,  Y02P40/57 ,  Y10S65/901

    Abstract: A process for easily producing a silica glass plate having an internal refractive index distribution suitable for a planar optical waveguide involves carrying out the following steps.(a) A porous silica gel plate produced by a sol-gel method is kept in a reactor, the pressure of which is reduced to a substantially vacuum state.(b) Germanium tetrachloride gas is introduced into the reactor at a partial pressure appropriate to establish an absorption equilibrium between a desired concentration of germanium tetrachloride in said porous silica gel plate and a partial pressure of germanium tetrachloride introduced.(c) The partial pressure of germanium tetrachloride in step (b) is reduced so as to desorb germanium tetrachloride from the surface of the porous silica gel plate.(d) The porous silica gel plate having a described concentration distribution is brought into contact with water within or outside the reactor so as to fix the distribution.(e) The porous silica gel plate is calcined at a temperature of not less than 900.degree. C. to render it nonporous.

    Abstract translation: 用于容易地生产具有适合于平面光波导的内部折射率分布的石英玻璃板的方法包括进行以下步骤。 （a）将通过溶胶 - 凝胶法制备的多孔硅胶板保持在反应器中，其压力降低至基本上真空状态。 （b）将四氯化锗气体以适于建立所述多孔硅胶板中所需浓度的四氯化锗与引入的四氯化锗的分压之间的吸收平衡的分压引入反应器。 （c）步骤（b）中的四氯化锗的分压降低，从而从多孔硅胶板的表面解吸四氯化锗。 （d）具有所述浓度分布的多孔硅胶板与反应器内部或外部的水接触以固定分布。 （e）多孔硅胶板在不低于900℃的温度下煅烧，使其无孔。

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