公开(公告)号：US11121521B2

公开(公告)日：2021-09-14

申请号：US16791488

申请日：2020-02-14

Applicant: KLA Corporation

Inventor： Ilya Bezel ,  Matthew Derstine ,  William Schumaker ,  Michael Friedmann

IPC: H01S3/13 ,  F21V9/06 ,  H01S3/102 ,  H01S3/10 ,  H01S3/0943 ,  H01S3/131 ,  H01S3/09 ,  H01S5/04

Abstract: A system for pumping laser sustained plasma is disclosed. The system includes a plurality of pump modules configured to generate respective pulses of pump illumination for the laser sustained plasma, wherein at least one pump module is configured to generate a train of pump pulses that is interlaced in time with another train of pump pulses generated by at least one other pump module of the plurality of pump modules. The system further includes a plurality of non-collinear illumination paths configured to direct the respective pulses of pump illumination from the plurality of pump modules into a collection volume of the laser sustained plasma.

公开(公告)号：US20200271569A1

公开(公告)日：2020-08-27

申请号：US15930379

申请日：2020-05-12

Applicant: KLA Corporation

Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann ,  Pablo Rovira

IPC: G01N21/21 ,  G01J3/02 ,  G01J4/00 ,  G02B27/28 ,  G02B27/30

Abstract: A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.