公开(公告)号：US20130176549A1

公开(公告)日：2013-07-11

申请号：US13737065

申请日：2013-01-09

Applicant: Hermes-Microvision, Inc.

Inventor： Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: G03F1/66

CPC classification number: G03F7/70741 ,  G03F1/66 ,  G03F7/70733

Abstract: A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask transferred from reticle SMIF pod into dual pod, and vice versa, or an operating system for tools relating to EUV mask, wherein the tools may be EUV lithography, or inspection tool for inspecting EUV mask.

Abstract translation: 提供了一种用于操作存储在掩模版SMIF盒和/或双盒中的EUV掩模的系统，其中标线片SMIF盒和双盒用于存储EUV掩模。 该系统可以是EUV掩模的分拣机，从掩模版SMIF荚转移到双荚，反之亦然，或与EUV掩模相关的工具的操作系统，其中工具可以是EUV光刻，或用于检查EUV掩模的检查工具。