公开(公告)号：US20140021348A1

公开(公告)日：2014-01-23

申请号：US13788035

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shahedul Hoque ,  Hajime Kawano

IPC: H01J37/244

CPC classification number: H01J37/29 ,  G01N23/203 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475

Abstract: The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.

Abstract translation: 本发明的目的是提供一种能够抑制由多个背散射电子检测器产生的电场的影响的电子束照射装置。 为了实现上述目的，配备有扫描偏转器的电子束照射装置包括多个背散射电子检测器，分别向多个背散射电子检测器施加电压的检测器的电源以及调节施加电压的控制装置 用于检测器的电源基于当将电压施加到多个后向散射电子检测器时的图像移位来传递。