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公开(公告)号：US09097434B2
公开(公告)日：2015-08-04
申请号：US13753324
申请日：2013-01-29
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Osamu Wakabayashi
CPC classification number: F24H1/0018 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.
Abstract translation: 在通过用激光束照射目标物而产生极紫外光的极紫外光装置中使用的目标供给装置可以包括：罐，包括通孔并且设置成使得通孔与内部连通的喷嘴 所述第一加热器沿着所述罐的壁布置，所述第二加热器沿着所述罐的壁布置在比所述第一加热器更远离所述喷嘴的位置，以及控制单元，其被配置为控制所述第一加热器和 所述第二加热器使得所述第一加热器的温度大于所述第二加热器的温度。
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公开(公告)号：US08779402B2
公开(公告)日：2014-07-15
申请号：US13675790
申请日：2012-11-13
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yukio Watanabe , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
IPC: G21K5/00
CPC classification number: B05B17/0607 , B05B12/082
Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。
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13.发明授权公开(公告)号：US10609803B2
公开(公告)日：2020-03-31
申请号：US16532124
申请日：2019-08-05
Applicant: Gigaphoton Inc.
Inventor： Yuichi Nishimura , Yoshifumi Ueno , Takayuki Yabu
Abstract: An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target desired centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target desired centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.
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公开(公告)号：US10303061B2
公开(公告)日：2019-05-28
申请号：US16001239
申请日：2018-06-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi Nishimura , Takayuki Yabu , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
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公开(公告)号：US10191381B2
公开(公告)日：2019-01-29
申请号：US15941858
申请日：2018-03-30
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu
Abstract: An extreme ultraviolet (EUV) light generator includes a generation region where a target generates EUV light, a mirror that focuses the EUV light, an illumination light source, and a light receiver to receive reflected light from the target. A reflection surface of the mirror defines first and second focuses at the generation region and a mirror focal point, respectively. A line segment that links a reflection surface outer peripheral edge and the first focus is rotated about an axis through the first and second focuses to form a first limit surface. The line segment and an extended line on the outer peripheral side rotated about the axis forms a second limit surface. At least one of an illumination light optical path and a reflected light optical path from the light source and the light receiver, respectively, passes through the first focus and extends between the first and second limit surfaces.
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Patent Agency Ranking
16.发明授权公开(公告)号：US10057972B2
公开(公告)日：2018-08-21
申请号：US15430737
申请日：2017-02-13
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi Ueno , Hirokazu Hosoda , Takayuki Yabu
CPC classification number: H05G2/008 , G03F7/70033 , H01L21/027 , H01S3/10061 , H05G2/003 , H05G2/006 , H05H1/24 , H05H15/00
Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.
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公开(公告)号：US09647406B2
公开(公告)日：2017-05-09
申请号：US15172757
申请日：2016-06-03
Applicant: GIGAPHOTON INC.
Inventor： Takashi Suganuma , Takayuki Yabu , Osamu Wakabayashi , Seiji Nogiwa
CPC classification number: H01S3/005 , H01S3/2232 , H01S3/2316 , H01S3/2366 , H05G2/005 , H05G2/008
Abstract: There is provided a laser unit that may include a master oscillator, a laser amplifier, and an adjuster. The master oscillator may be configured to output a laser light beam. The laser amplifier may be disposed in a light path of the laser light beam outputted from the master oscillator. The adjuster may be disposed in the light path of the laser light beam, and may be configured to adjust a beam cross-sectional shape of the laser light beam amplified by the laser amplifier to be a substantially circular shape. The beam cross-sectional shape may be at a beam waist of the laser light beam or in the vicinity of the beam waist of the laser light beam, and may be in a plane orthogonal to a light path axis.
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公开(公告)号：US09439276B2
公开(公告)日：2016-09-06
申请号：US14937332
申请日：2015-11-10
Applicant: GIGAPHOTON INC.
Inventor： Takayuki Yabu , Takashi Saito , Osamu Wakabayashi
CPC classification number: H05G2/008 , G03F7/2006 , G03F7/70033 , H05G2/006
Abstract: There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.
Abstract translation: 提供了一种极紫外光发生系统。 所述极紫外光发生系统可以包括：激光装置，被配置为在其内产生EUV光的室内提供脉冲激光; 设置在所述脉冲激光的光路上的光学快门; 以及控制器，其被配置为基于从外部单元提供的生成信号来打开或关闭所述光学快门，所述生成信号指示所述EUV光的产生。
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19.发明授权公开(公告)号：US11924954B2
公开(公告)日：2024-03-05
申请号：US17393149
申请日：2021-08-03
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yuta Takashima
CPC classification number: H05G2/008 , G02B5/3091
Abstract: An extreme ultraviolet light generation apparatus may include a target supply unit supplying a target to a plasma generation region in a chamber, a laser system emitting first laser light having a polarization direction deflected in one direction and second laser light to generate a secondary target that is the target diffused by irradiating the target with the first laser light from a direction perpendicular to a travel axis of the target and to generate extreme ultraviolet light by irradiating the secondary target with the second laser light, a polarization direction adjustment unit arranged on an optical path of the first laser light and configured to adjust the polarization direction of the first laser light, a secondary target observation unit configured to observe a distribution of the secondary target, and a processor controlling the polarization direction adjustment unit based on an observation result of the secondary target observation unit.
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公开(公告)号：US10271414B2
公开(公告)日：2019-04-23
申请号：US15697915
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Kouichi Satou , Takayuki Yabu , Yoshifumi Ueno , Hirokazu Hosoda
Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.
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