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公开(公告)号：US20170064800A1
公开(公告)日：2017-03-02
申请号：US15347241
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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公开(公告)号：US20130322483A1
公开(公告)日：2013-12-05
申请号：US13931840
申请日：2013-06-29
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Fumika YOSHIDA , Osamu WAKABAYASHI , Kouji KAKIZAKI
IPC: H01S3/034
CPC classification number: H01S3/034 , G02B1/02 , G02B5/3091 , H01S3/0346 , H01S3/08054 , H01S3/0816 , H01S3/225 , H01S3/2251
Abstract: A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.
Abstract translation: 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。
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Patent Agency Ranking
公开(公告)号：US20130256567A1
公开(公告)日：2013-10-03
申请号：US13903811
申请日：2013-05-28
Applicant: GIGAPHOTON INC.
Inventor： Kouji KAKIZAKI , Shinji NAGAI , Tatsuya YANAGIDA
IPC: G21K5/00
CPC classification number: G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。
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14.发明申请公开(公告)号：US20210235571A1
公开(公告)日：2021-07-29
申请号：US17226515
申请日：2021-04-09
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Shinji NAGAI
Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
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公开(公告)号：US20170315446A1
公开(公告)日：2017-11-02
申请号：US15651259
申请日：2017-07-17
Applicant: GIGAPHOTON INC.
Inventor： Atsushi UEDA , Shinji NAGAI
CPC classification number: G03F7/2008 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
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公开(公告)号：US20170094767A1
公开(公告)日：2017-03-30
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Shinji NAGAI , Yoshifumi UENO , Tamotsu ABE
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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公开(公告)号：US20150008345A1
公开(公告)日：2015-01-08
申请号：US14481620
申请日：2014-09-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在所述室上的蚀刻气体导入单元，所述蚀刻气体通过所述室; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
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