公开(公告)号：US4847504A

公开(公告)日：1989-07-11

申请号：US832327

申请日：1986-02-24

Applicant: Derek Aitken

Inventor： Derek Aitken

IPC: H01J27/02 ,  H01J27/14 ,  H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J49/30

CPC classification number: H01J27/14 ,  H01J27/022 ,  H01J27/028 ,  H01J37/05 ,  H01J37/08 ,  H01J37/3171 ,  H01J49/30

Abstract: A system for implanting ions into a target element including a source arrangement for producing an ion beam; a beam analyzing arrangement for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangement disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The analyzing arrangement has an ion dispersion plane associated therewith. The source arrangement has an associated ion emitting envelope including an area of substantial extension in a plane parallel to the ion dispersion plane and producing ions entering said analyzing arrangement which are travelling substantially either toward or from a common apparent line object lying in a plane perpendicular to the ion dispersion plane.

Abstract translation: 一种用于将离子注入到包括用于产生离子束的源装置的目标元件中的系统; 用于接收离子束的束分析装置，并且基于质量选择性地分离束中的各种离子物质以产生分析的束; 以及设置在分析光束的路径中以允许预选离子物质传递到目标元件的光束分辨装置。 分析装置具有与其相关联的离子色散平面。 源装置具有相关联的离子发射外壳，其包括在平行于离子色散平面的平面中具有显着延伸的区域，并产生进入所述分析装置的离子，其基本上朝向或离开位于垂直于垂直于 离子色散平面。

公开(公告)号：US4782304A

公开(公告)日：1988-11-01

申请号：US898389

申请日：1986-08-20

Applicant: Derek Aitken

Inventor： Derek Aitken

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3007 ,  H01J37/317

Abstract: A system for post analysis acceleration of an ion beam to a selected energy without beam blow-up. A group of electrodes extablish a non-linear voltage gradient along the beam axis for accelerating and then decelerating the beam to the selected energy level with focusing.

Abstract translation: 用于后分析将离子束加速到所选能量而不产生光束吹扫的系统。 一组电极沿光束轴线提供非线性电压梯度，用于加速然后将光束减小到所选择的能量水平与聚焦。

公开(公告)号：US4754200A

公开(公告)日：1988-06-28

申请号：US774110

申请日：1985-09-09

Applicant: Frederick Plumb ,  Christopher Wright ,  Nicholas J. Bright ,  Derek Aitken ,  Bernard Harrison

Inventor： Frederick Plumb ,  Christopher Wright ,  Nicholas J. Bright ,  Derek Aitken ,  Bernard Harrison

IPC: H01L21/265 ,  H01J27/02 ,  H01J27/14 ,  H01J37/08 ,  H01J37/24 ,  H01J37/248 ,  H01J37/317 ,  H01J7/24 ,  H05B31/26

CPC classification number: H01J37/24 ,  H01J27/022 ,  H01J27/14 ,  H01J37/08 ,  H01J37/3171

Abstract: A method for operating an ion source having a filament-cathode and an anode. The method includes supplying direct current electrical power between the anode and the filament-cathode characterized by substantially constant arc current there between and varying arc voltage on the filament-cathode. Direct current electrical power is also supplied across the filament-cathode. The value of the arc voltage is monitored and the magnitude of electrical power supplied to the filament-cathode is altered in response to detected changes in the arc voltage to return the arc voltage to substantially a preset reference value. The monitoring step and the altering step are carried out at regular preset intervals. The altering step includes deriving an filament power error signal as a prearranged function which includes the difference in values between the monitored arc voltage and the preset reference value multiplied by a predefined integral gain value. The altering step also includes altering the magnitude of electrical power supplied to the filament-cathode by the value of the filament power error signal.

Abstract translation: 一种用于操作具有丝 - 阴极和阳极的离子源的方法。 该方法包括在阳极和灯丝阴极之间提供直流电力，其特征在于其上的基本恒定的电弧电流和灯丝阴极之间的电弧电压变化。 直流电功率也在灯丝阴极上提供。 监测电弧电压的值，并且响应于检测到的电弧电压的变化而改变提供给灯丝 - 阴极的电力的大小，以将电弧电压恢复到基本上预设的参考值。 监视步骤和改变步骤以规定的预设间隔进行。 改变步骤包括导出灯丝功率误差信号作为预定功能，其包括监视的电弧电压和预设参考值之间的值之差乘以预定的积分增益值。 改变步骤还包括通过灯丝功率误差信号的值来改变提供给灯丝 - 阴极的电力的大小。

公开(公告)号：US4743767A

公开(公告)日：1988-05-10

申请号：US905719

申请日：1986-09-09

Applicant: Frederick Plumb ,  Christopher Wright ,  Nicholas J. Bright ,  Derek Aitken ,  Bernard Harrison

Inventor： Frederick Plumb ,  Christopher Wright ,  Nicholas J. Bright ,  Derek Aitken ,  Bernard Harrison

IPC: H01J27/02 ,  H01J27/14 ,  H01J37/08 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J27/022 ,  H01J27/14 ,  H01J37/08 ,  H01J37/24

Abstract: An ion implantation system includes a beam generating arrangement for generating an ion beam characterized by good beam stability and for directing the ion beam along a prearranged path. A beam stopping arrangement is disposed in the path of the beam for stopping and collecting the ions in the beam. A workpiece scanning arrangement is positioned upstream of the beam stopping arrangement for scanning a workpiece through the beam in a prearranged combined fast scan directional motion and a slow scan directional motion with the slow scan directional motion being characterized by an end of scan position in which the ion beam falls completely on the beam stopping arrangement. A dose measuring arrangement is coupled to the beam stopping arrangement and includes arrangements for measuring the ion beam current on the beam stop at the end of scan position of the workpiece scanning arrangement, for calculating the average ion beam current striking the workpiece during each slow scan directional motion as the average of two successive ion beam current measurements before and after the motion, and for calculating the ion dose delivered to the workpiece based on the calculated average ion beam current and know geometrical factors associated with the fast and slow scan motions.

Abstract translation: 离子注入系统包括用于产生特征在于良好光束稳定性并用于沿着预定路径引导离子束的离子束的光束产生装置。 光束停止装置设置在光束的路径中，用于停止和收集光束中的离子。 工件扫描装置位于光束停止装置的上游，用于以预先布置的组合快速扫描定向运动和慢速扫描定向运动扫描通过光束的工件，其中慢扫描定向运动的特征在于扫描位置的结束，其中 离子束完全落在光束停止装置上。 剂量测量装置耦合到光束停止装置，并且包括用于测量在工件扫描装置的扫描位置结束时在光束挡块上的离子束电流的装置，用于计算在每个慢扫描期间撞击工件的平均离子束电流 作为运动之前和之后的两个连续的离子束电流测量的平均值的方向运动，以及用于基于计算出的平均离子束电流和知道与快速和慢速扫描运动相关联的几何因素来计算递送到工件的离子剂量。