Methods and apparatuses for forming optical preforms from glass soot
    16.
    发明授权
    Methods and apparatuses for forming optical preforms from glass soot 有权
    从玻璃烟灰形成光学预成型件的方法和装置

    公开(公告)号:US09376338B2

    公开(公告)日:2016-06-28

    申请号:US14520799

    申请日:2014-10-22

    Abstract: Methods and apparatuses for forming optical preforms from silica glass soot are disclosed. According to one embodiment, a method for forming an optical preform may include loading silica glass soot in a mold cavity of a mold body. The mold body may be rotated at a rotational speed sufficient to force the silica glass soot towards an inner wall of the mold body. Thereafter the silica glass soot is compressed in an inward radial direction as the mold body is rotated to form a soot compact layer.

    Abstract translation: 公开了用于从石英玻璃烟灰形成光学预型件的方法和装置。 根据一个实施例,用于形成光学预型件的方法可以包括将二氧化硅玻璃烟灰装载在模具体的模腔中。 模具主体可以以足以迫使石英玻璃烟炱朝向模具体的内壁的旋转速度旋转。 此后,随着模具体的旋转,二氧化硅玻璃烟炱向内径向压缩以形成烟炱压实层。

    METHODS AND APPARATUSES FOR FORMING OPTICAL PREFORMS FROM GLASS SOOT
    19.
    发明申请
    METHODS AND APPARATUSES FOR FORMING OPTICAL PREFORMS FROM GLASS SOOT 有权
    从玻璃制成光学预制件的方法和装置

    公开(公告)号:US20150128649A1

    公开(公告)日:2015-05-14

    申请号:US14520799

    申请日:2014-10-22

    Abstract: Methods and apparatuses for forming optical preforms from silica glass soot are disclosed. According to one embodiment, a method for forming an optical preform may include loading silica glass soot in a mold cavity of a mold body. The mold body may be rotated at a rotational speed sufficient to force the silica glass soot towards an inner wall of the mold body. Thereafter the silica glass soot is compressed in an inward radial direction as the mold body is rotated to form a soot compact layer.

    Abstract translation: 公开了用于从石英玻璃烟灰形成光学预型件的方法和装置。 根据一个实施例,用于形成光学预型件的方法可以包括将二氧化硅玻璃烟灰装载在模具体的模腔中。 模具主体可以以足以迫使石英玻璃烟炱朝向模具体的内壁的旋转速度旋转。 此后,随着模具体的旋转,二氧化硅玻璃烟炱向内径向压缩以形成烟炱压实层。

    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING
    20.
    发明申请
    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING 审中-公开
    用于光伏照明的硅片的机械和化学文化

    公开(公告)号:US20130344641A1

    公开(公告)日:2013-12-26

    申请号:US13841109

    申请日:2013-03-15

    Abstract: A process for modifying a surface of a cast polycrystalline silicon sheet to decrease the light reflectance of the cast polycrystalline sheet is disclosed. The cast polycrystalline silicon sheet has at least one structural feature resulting from the cast polycrystalline silicon sheet being directly cast to a thickness less than 1000 micrometers. The process comprises grit blasting the surface of the cast polycrystalline silicon sheet to give an abraded surface on the cast polycrystalline silicon sheet. The process further comprises chemically etching the abraded surface of the cast polycrystalline silicon sheet to give a chemically-etched, abraded surface. The light reflectance of the chemically-etched, abraded surface is decreased in comparison to the light reflectance of the surface of the cast polycrystalline silicon sheet before the step of grit blasting.

    Abstract translation: 公开了一种用于改变流延多晶硅片的表面以降低铸塑多晶片的光反射率的方法。 铸造的多晶硅片具有至少一个由铸造的多晶硅片直接铸造成小于1000微米厚度的结构特征。 该方法包括喷砂铸造多晶硅片的表面以在铸造多晶硅片上产生磨损表面。 该方法还包括化学蚀刻流延多晶硅片的磨损表面以产生化学蚀刻的磨损表面。 与喷砂步骤之前的铸造多晶硅片的表面的光反射率相比,化学蚀刻的磨损表面的光反射率降低。

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