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11.Photosensitive gas phase etching of semiconductors by selective radiation 失效
Title translation: 通过选择性辐射对半导体的感光气相蚀刻公开(公告)号:US3095332A
公开(公告)日:1963-06-25
申请号:US12106661
申请日:1961-06-30
Applicant: BELL TELEPHONE LABOR INC
Inventor: LIGENZA JOSEPH R
IPC: B01J19/12 , C03C15/00 , C04B41/53 , C23F1/12 , H01L21/00 , H01L21/3065 , H01L21/311 , H01L23/29
CPC classification number: H01L21/00 , B01J19/123 , C03C15/00 , C04B41/5346 , C23F1/12 , H01L21/3065 , H01L21/31116 , H01L23/291 , H01L2924/0002 , H01L2924/00