公开(公告)号：US20230164900A1

公开(公告)日：2023-05-25

申请号：US18011593

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Igorevich Ershov ,  Chirag Rajyaguru ,  Dietmar Uwe Herbert Trees ,  Joshua Mark Lukens ,  Theodorus Wilhelmus Driessen ,  Robert Jay Rafac ,  Georgiy Olegovich Vaschenko

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008 ,  G03F7/70033

Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.

公开(公告)号：US20220363596A1

公开(公告)日：2022-11-17

申请号：US17767179

申请日：2020-10-09

Applicant: ASML Netherlands B.V.

Inventor： Dietmar Uwe Herbert Trees ,  Edwin Johan Buis ,  Theodorus Wilhelmus Driessen ,  Benjamin Andrew Sams ,  Brandon Michael Johnson

IPC: C03C27/02 ,  H05G2/00 ,  G03F7/20

Abstract: A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and applying a pressure to the glass capillary such that the glass capillary conforms to the shape of, and forms a direct glass-to-metal seal with, the throughbore. Also disclosed is a nozzle for a droplet generator for a laser-produced plasma radiation source, and the radiation source itself, wherein the nozzle comprises the glass capillary for emitting fuel as droplets and the metal fitting for coupling the glass capillary to a body of the droplet generator, the glass capillary being conformed to a shape of a throughbore of the metal fitting, and wherein the glass capillary forms a direct glass-to-metal seal with the throughbore.

公开(公告)号：US20180368242A1

公开(公告)日：2018-12-20

申请号：US15962307

申请日：2018-04-25

Applicant: ASML Netherlands B.V.

Inventor： Koen Gerhardus Winkels ,  Georgiy O. Vaschenko ,  Theodorus Wilhelmus Driessen ,  Johan Frederik Dijksman ,  Bastiaan Lambertus Wilhelmus Marinus van de Ven ,  Wilhelmus Henricus Theodorus Maria Aangenent

IPC: H05G2/00 ,  G03F7/20 ,  B81C1/00

Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.

公开(公告)号：US12232244B2

公开(公告)日：2025-02-18

申请号：US17428814

申请日：2020-02-07

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus Driessen

IPC: H01J37/153 ,  H05G2/00

Abstract: A target apparatus (300) for an extreme ultraviolet (EUV) light source includes a target generator, a sensor module (130), and a target generator controller (325). The target generator includes a reservoir (115) configured to contain target material (114) that produces EUV light in a plasma state and a nozzle structure (117) in fluid communication with the reservoir. The target generator defines an opening (119) in the nozzle structure through which the target material received from the reservoir is released. The sensor module is configured to: detect an aspect relating to target material released from the opening as the target material travels along a trajectory toward a target space (112), and produce a one-dimensional signal from the detected aspect. The target generator controller is in communication with the sensor module and the target generator, and is configured to modify characteristics of the target material based on an analysis of the one-dimensional signal.

公开(公告)号：US12139436B2

公开(公告)日：2024-11-12

申请号：US17767179

申请日：2020-10-09

Applicant: ASML Netherlands B.V.

Inventor： Dietmar Uwe Herbert Trees ,  Edwin Johan Buis ,  Theodorus Wilhelmus Driessen ,  Benjamin Andrew Sams ,  Brandon Michael Johnson

IPC: H05G2/00 ,  C03C27/02 ,  G03F7/00

Abstract: A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and applying a pressure to the glass capillary such that the glass capillary conforms to the shape of, and forms a direct glass-to-metal seal with, the throughbore. Also disclosed is a nozzle for a droplet generator for a laser-produced plasma radiation source, and the radiation source itself, wherein the nozzle comprises the glass capillary for emitting fuel as droplets and the metal fitting for coupling the glass capillary to a body of the droplet generator, the glass capillary being conformed to a shape of a throughbore of the metal fitting, and wherein the glass capillary forms a direct glass-to-metal seal with the throughbore.

公开(公告)号：US20240361222A1

公开(公告)日：2024-10-31

申请号：US18576266

申请日：2022-06-24

Applicant: ASML Netherlands B.V.

Inventor： Dustin Michael Urone ,  Theodorus Wilhelmus Driessen ,  Daniel Jason Riggs ,  Rodney D. Simmons ,  Jaden Robert Bankhead ,  Paul Alexander McKenzie

IPC: G01N15/0205 ,  H05G2/00

CPC classification number: G01N15/0211 ,  H05G2/008

Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.

公开(公告)号：US20220104335A1

公开(公告)日：2022-03-31

申请号：US17428814

申请日：2020-02-07

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus Driessen

IPC: H05G2/00

Abstract: A target apparatus (300) for an extreme ultraviolet (EUV) light source includes a target generator, a sensor module (130), and a target generator controller (325). The target generator includes a reservoir (115) configured to contain target material (114) that produces EUV light in a plasma state and a nozzle structure (117) in fluid communication with the reservoir. The target generator defines an opening (119) in the nozzle structure through which the target material received from the reservoir is released. The sensor module is configured to: detect an aspect relating to target material released from the opening as the target material travels along a trajectory toward a target space (112), and produce a one-dimensional signal from the detected aspect. The target generator controller is in communication with the sensor module and the target generator, and is configured to modify characteristics of the target material based on an analysis of the one-dimensional signal.