公开(公告)号：US20140300883A1

公开(公告)日：2014-10-09

申请号：US14273335

申请日：2014-05-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US09715178B2

公开(公告)日：2017-07-25

申请号：US14266534

申请日：2014-04-30

Applicant: ASML HOLDING N.V.

Inventor： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

公开(公告)号：US20140333910A1

公开(公告)日：2014-11-13

申请号：US14444887

申请日：2014-07-28

Applicant: ASML HOLDING N.V.

Inventor： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

Abstract translation: 液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。 液体供应系统在投影光学系统和基板之间提供液体流动。 可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

公开(公告)号：US09709899B2

公开(公告)日：2017-07-18

申请号：US14444887

申请日：2014-07-28

Applicant: ASML HOLDING N.V.

Inventor： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

公开(公告)号：US20170293231A1

公开(公告)日：2017-10-12

申请号：US15627040

申请日：2017-06-19

Applicant: ASML HOLDING N.V.

Inventor： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.