公开(公告)号：US12216414B2

公开(公告)日：2025-02-04

申请号：US18012799

申请日：2021-06-09

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Justin Lloyd Kreuzer ,  Stephen Roux

IPC: G01B11/00 ,  G03F9/00

Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.

公开(公告)号：US11415893B2

公开(公告)日：2022-08-16

申请号：US16760357

申请日：2018-10-05

Applicant: ASML Holding N.V.

Inventor： Stephen Roux ,  Christopher William Reed

IPC: G03F7/20

Abstract: An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.

公开(公告)号：US12140872B2

公开(公告)日：2024-11-12

申请号：US17796640

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Stephen Roux ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/00 ,  G03F9/00

Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

公开(公告)号：US11966169B2

公开(公告)日：2024-04-23

申请号：US17029845

申请日：2020-09-23

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Elazhary ,  Stephen Roux ,  Yuxiang Lin ,  Justin Lloyd Kreuzer

IPC: G03F7/00 ,  G01B11/14 ,  G01B11/27 ,  G02B6/12 ,  G02B6/293 ,  H01L21/67

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/272 ,  G02B6/12007 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/7085 ,  G01B2210/56 ,  G02B6/29301 ,  G02B6/29395 ,  G03F7/70608 ,  H01L21/67259

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.