公开(公告)号：US07478019B2

公开(公告)日：2009-01-13

申请号：US11043196

申请日：2005-01-26

Applicant: Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

Inventor： Shahin Zangooie ,  Youxian Wen ,  Heath Pois ,  Jon Opsal

IPC: G06F17/10

CPC classification number: G01B11/0625 ,  G05B13/024 ,  G05B15/02

Abstract: Measurement data sets for optical metrology systems can be processed in parallel using Multiple Tool and Structure Analysis (MTSA). In an MTSA procedure, at least one parameter that is common to the data sets can be coupled as a global parameter. Setting this parameter as global allows a regression on each data set to contain fewer fitting parameters, making the process is less complex, requiring less processing capacity, and providing more accurate results. MTSA can analyze multiple structures measured on a single tool, or a single structure measured on separate tools. For a multiple tool recipe, a minimized regression solution can be applied back to each tool to determine whether the recipe is optimized. If the recipe does not provide accurate results for each tool, search parameters and/or spaces can be modified in an iterative manner until an optimized solution is obtained that provides acceptable solutions on each tool.

Abstract translation: 光学测量系统的测量数据集可以使用多工具和结构分析（MTSA）并行处理。 在MTSA过程中，数据集共有的至少一个参数可以作为全局参数进行耦合。 将此参数设置为全局允许每个数据集的回归包含较少的拟合参数，使得该过程不太复杂，需要较少的处理能力，并提供更准确的结果。 MTSA可以分析在单个工具上测量的多个结构，或分析在单独工具上测量的单个结构。 对于多重工具配方，可以将最小化回归解决方案应用回每个工具以确定配方是否被优化。 如果配方不能为每个工具提供准确的结果，则可以以迭代的方式修改搜索参数和/或空格，直到获得优化的解决方案，为每个工具提供可接受的解决方案。

公开(公告)号：US20080158565A1

公开(公告)日：2008-07-03

申请号：US12022504

申请日：2008-01-30

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07362441B2

公开(公告)日：2008-04-22

申请号：US11520512

申请日：2006-09-13

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20080036998A1

公开(公告)日：2008-02-14

申请号：US11890712

申请日：2007-08-06

Applicant: Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

Inventor： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC: G01N1/00

CPC classification number: G01N21/1717 ,  G01N21/4788 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2021/1731 ,  G01N2021/214

Abstract: The present invention provides a probe beam profile—modulated optical reflectivity metrology system having a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample in a manner so that the rays within the probe beam create a spread of angles of incidence. A detector array simultaneously measures intensities of the rays within the reflected/diffracted probe beam simultaneously at different angles of incidence. The intensity and angle of incidence information is used to analyze the sample.

Abstract translation: 本发明提供一种具有用于激发样品的调制泵浦源的探测光束分布调制光学反射率测量系统。 引导单独的探针光束以与样品相互作用的方式使得探针束内的光线产生入射角的扩展。 检测器阵列同时以不同的入射角测量反射/衍射探测光束内的光线的强度。 使用入射信息的强度和角度分析样品。

公开(公告)号：US20080018895A1

公开(公告)日：2008-01-24

申请号：US11715668

申请日：2007-03-08

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01J4/00

CPC classification number: G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract translation: 公开了一种用于从样品获得椭偏测量的装置。 探针光束聚焦在样品上以产生入射角的扩展。 光束通过四分之一波片延迟器和偏振器。 反射光束由检测器测量。 在一个优选实施例中，检测器包括八个径向布置的段，每个段产生表示多个入射角的积分的输出。 处理器处理来自各个段的输出以导出椭偏信息。

公开(公告)号：US07248375B2

公开(公告)日：2007-07-24

申请号：US11231638

申请日：2005-09-21

Applicant: Jon Opsal ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Allan Rosencwaig

IPC: G01B11/02

CPC classification number: G01B11/024 ,  G01B11/02 ,  G01B11/14 ,  G03F7/70625

Abstract: A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source is used. A lens is used to focus the probe beam on the sample in a manner so that rays within the probe beam create a spread of angles of incidence. The size of the probe beam spot on the sample is larger than the spacing between the features of the periodic structure so some of the light is scattered from the structure. A detector is provided for monitoring the reflected and scattered light. The detector includes multiple detector elements arranged so that multiple output signals are generated simultaneously and correspond to multiple angles of incidence. The output signals are supplied to a processor which analyzes the signals according to a scattering model which permits evaluation of the geometry of the periodic structure. In one embodiment, the sample is scanned with respect to the probe beam and output signals are generated as a function of position of the probe beam spot.

Abstract translation: 公开了一种用于评估在半导体样品上形成的相对小的周期性结构的方法和装置。 在这种方法中，光源产生指向样品的探针束。 在一个优选实施例中，使用非相干光源。 使用透镜将探针束聚焦在样品上，使得探针束内的射线产生入射角的扩展。 样品上的探针光斑的尺寸大于周期结构特征之间的间距，所以一些光从结构散射。 提供了一种用于监测反射和散射光的检测器。 检测器包括多个检测器元件，其布置成使得多个输出信号同时产生并对应于多个入射角。 输出信号被提供给处理器，该处理器根据允许评估周期性结构的几何形状的散射模型分析信号。 在一个实施例中，相对于探测光束扫描样品，并且根据探针束斑的位置产生输出信号。

公开(公告)号：US07212288B2

公开(公告)日：2007-05-01

申请号：US10886110

申请日：2004-07-07

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik

IPC: G01N21/55

CPC classification number: G01N21/9501 ,  G01N21/1717 ,  G01N21/9505

Abstract: A system for evaluating semiconductor wafers includes illumination sources for generating probe and pump beams. The pump beam is focused on the surface of a sample and a beam steering mechanism is used to modulate the point of focus in a predetermined pattern. The moving pump beam introduces thermal and plasma waves in the sample causing changes in the reflectivity of the surface of the sample. The probe beam is focused within or adjacent to the area illuminated by the pump beam. The reflected probe beam is gathered and used to measure the changes in reflectivity induced by the pump beam. By analyzing changes in reflectivity, a processor is able to deduce structure and chemical details of the sample.

Abstract translation: 用于评估半导体晶片的系统包括用于产生探针和泵浦光束的照明源。 泵浦光束聚焦在样品的表面上，并且使用光束转向机构以预定图案调制聚焦点。 移动的泵浦光束在样品中引入热和等离子体波，导致样品表面的反射率的变化。 探测光束聚焦在由泵浦光束照射的区域内或附近。 反射的探测光束被聚集并用于测量由泵浦光引起的反射率的变化。 通过分析反射率的变化，处理器能够推断样品的结构和化学细节。

公开(公告)号：US07206071B2

公开(公告)日：2007-04-17

申请号：US11273686

申请日：2005-11-14

Applicant: Jon Opsal

Inventor： Jon Opsal

IPC: G01B11/06

CPC classification number: G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N2021/213

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract translation: 公开了一种用于从样品获得椭偏测量的装置。 探针光束聚焦在样品上以产生入射角的扩展。 光束通过四分之一波片延迟器和偏振器。 反射光束由检测器测量。 在一个优选实施例中，检测器包括八个径向布置的段，每个段产生表示多个入射角的积分的输出。 处理器处理来自各个段的输出以导出椭偏信息。

公开(公告)号：US20070008541A1

公开(公告)日：2007-01-11

申请号：US11520512

申请日：2006-09-13

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20060262314A1

公开(公告)日：2006-11-23

申请号：US11492583

申请日：2006-07-25

Applicant: Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

Inventor： Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

IPC: G01N21/55

CPC classification number: G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.