On-press developable lithographic printing plates with high plasticizer
content photoresists
    101.
    发明授权
    On-press developable lithographic printing plates with high plasticizer content photoresists 失效
    具有高增塑剂含量的光刻胶的印刷机可印刷的平版印刷版

    公开(公告)号:US5607816A

    公开(公告)日:1997-03-04

    申请号:US531853

    申请日:1995-09-21

    Abstract: Described is the use of a plasticizing-permeation enhancing additive in negative-working, on-press developable lithographic printing plates. Briefly, a plasticizer, which is dispersible or soluble in press fountain and ink solutions and soluble in acrylic monomers and oligomers, are incorporated into a plate's photoresist at concentrations sufficient to enhance said resist's permeability to or diffusion by press solutions. Such additives make the photoresist more permeable to fountain solution prior to crosslinking, while being easily extracted with ink and fountain solution after crosslinking. In certain embodiments, a surfactant is added to facilitate the dispersion of hydrophobic remnants of removed resist material in the fountain solution, and thereby reduce scumming. Lithium salts may also be incorporated into the photoresist to disrupt hydrogen bonding of, for example, urethane acrylate polymers which tend to associate by hydrogen bonding.

    Abstract translation: 描述的是增塑增透添加剂在负压,可印刷的平版印刷版中的用途。 简而言之,在压力喷泉和油墨溶液中可分散或可溶于可溶于丙烯酸单体和低聚物的增塑剂以足以增强抗蚀剂渗透性或通过压制溶液扩散的浓度掺入板的光致抗蚀剂中。 这种添加剂使得光致抗蚀剂在交联之前对润版液更具渗透性,同时在交联后容易地用油墨和润版液萃取。 在某些实施方案中,加入表面活性剂以促进去除的抗蚀剂材料的疏水残余物在润版液中的分散,从而减少浮渣。 锂盐也可以掺入光致抗蚀剂中以破坏例如倾向于通过氢键缔合的氨基甲酸酯丙烯酸酯聚合物的氢键。

    Photoresist composition including polyphenol and sensitizer
    104.
    发明授权
    Photoresist composition including polyphenol and sensitizer 失效
    光敏剂组合物包括多酚和敏化剂

    公开(公告)号:US5212044A

    公开(公告)日:1993-05-18

    申请号:US793260

    申请日:1991-11-13

    CPC classification number: G03F7/0758 G03F7/039

    Abstract: A photoresist composition, and a process for using the same are; the composition comprises a polyphenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkali solubility to said composition, wherein said resin is represented by the formula (I) or (II): ##STR1## wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group or an aryl group; R' is a silyl group; and n and n'+m are greater than 3. The composition exhibits high thermal and plasmal resistance and good dissolution characteristics.

    Abstract translation: 光致抗蚀剂组合物及其使用方法是: 组合物包含多酚类树脂和敏化剂,当暴露于光化辐射时,对所述组合物具有碱溶性,其中所述树脂由式(I)或(II)表示: (II)其中R为氢原子,卤原子,烷基,烷氧基,烷芳基或芳基; R'是甲硅烷基; 并且n和n'+ m大于3.该组合物表现出高的耐热和耐候性和良好的溶解特性。

    Method for producing microcapsules and photosensitive microcapsules
produced thereby
    107.
    发明授权
    Method for producing microcapsules and photosensitive microcapsules produced thereby 失效
    由此制备微胶囊和感光微胶囊的方法

    公开(公告)号:US4977060A

    公开(公告)日:1990-12-11

    申请号:US447283

    申请日:1989-12-07

    CPC classification number: G03F7/002 Y10T428/2985

    Abstract: A process for producing microcapsules comprising the steps of: adding a hydroxy or amine functionalized acrylic resin or copolymer to an aqueous emulsion including a dispersed internal phase composition;simultaneously or subsequently adding a formaldehyde condensate prepolymer to said emulsion; andforming interpenetrating polymer network microcapsule walls around said internal phase, said interpenetrating polymer network microcapsule walls comprising the condensation reaction product of said functionalized acrylic resin or copolymer and said formaldehyde condensate prepolymer is disclosed.

    Abstract translation: 一种生产微胶囊的方法,包括以下步骤:将羟基或胺官能化的丙烯酸树脂或共聚物加入到包含分散的内相组合物的水性乳液中; 同时或随后向所述乳液中加入甲醛缩合物预聚物; 并且在所述内相周围形成互穿聚合物网络微胶囊壁,所述互穿聚合物网络微胶囊壁包含所述官能化丙烯酸树脂或共聚物与所述甲醛缩合物预聚物的缩合反应产物。

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