公开(公告)号：US20250138434A1

公开(公告)日：2025-05-01

申请号：US18806848

申请日：2024-08-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yeongchan CHO ,  Minjae KIM ,  Sungmin NAM ,  Seunghune YANG

IPC: G03F7/00

Abstract: Provided are a method of configuring an optimized extreme ultraviolet (EUV) illumination system, and an EUV exposure method using the EUV illumination system. The method of configuring the EUV illumination system includes calculating an aerial image by performing an optical simulation with respect to each of EUV point sources, summing up the aerial images based on EUV mapping, searching for a combination of the EUV point sources by using a fitness value with respect to the summed aerial image, and configuring the EUV illumination system as a combination of the EUV point sources, which has a maximum fitness value.