PLASMA MONITORING SYSTEM
    4.
    发明公开

    公开(公告)号:US20240290590A1

    公开(公告)日:2024-08-29

    申请号:US18520360

    申请日:2023-11-27

    CPC classification number: H01J37/32972 H01J37/023 H01J37/226

    Abstract: A plasma monitoring system includes a gate valve disposed on a first side of a chamber, where the gate valve is opened or closed in conjunction with a plasma monitoring operation, a viewport structure disposed outside the chamber and including a plurality of light transmitting parts, and an optical emission spectroscopy disposed outside the chamber, where the optical emission spectroscopy monitors plasma by receiving plasma light transmitted through at least one of the plurality of light transmitting parts of the viewport structure.

    DISPLAY DEVICE
    5.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20240094573A1

    公开(公告)日:2024-03-21

    申请号:US18515203

    申请日:2023-11-20

    CPC classification number: G02F1/133305 G02F1/1339

    Abstract: A display device includes: a first substrate including a first area, a second area surrounding the first area, and a third area surrounding the second area; a second substrate facing the first substrate; a sealing member between the first substrate and the second substrate at the third area; a color filter layer under the second substrate; a low refractive index layer under the color filter layer, overlapping with the first area, and spaced from the sealing member; a protective layer covering the low refractive index layer, surrounding a side surface of the low refractive index layer, and including an inorganic material; and a color conversion layer under the protective layer, overlapping with the first area, and including a plurality of color conversion parts spaced from each other.

    DISPLAY DEVICE
    9.
    发明公开
    DISPLAY DEVICE 审中-公开

    公开(公告)号:US20230288741A1

    公开(公告)日:2023-09-14

    申请号:US18046430

    申请日:2022-10-13

    CPC classification number: G02F1/133305 G02F1/1339

    Abstract: A display device includes: a first substrate including a first area, a second area surrounding the first area, and a third area surrounding the second area; a second substrate facing the first substrate; a sealing member between the first substrate and the second substrate at the third area; a color filter layer under the second substrate; a low refractive index layer under the color filter layer, overlapping with the first area, and spaced from the sealing member; a protective layer covering the low refractive index layer, surrounding a side surface of the low refractive index layer, and including an inorganic material; and a color conversion layer under the protective layer, overlapping with the first area, and including a plurality of color conversion parts spaced from each other.

    SUBSTRATE PROCESSING APPARATUS AND METHOD OF MEASURING FILM THICKNESS

    公开(公告)号:US20230160688A1

    公开(公告)日:2023-05-25

    申请号:US17955660

    申请日:2022-09-29

    CPC classification number: G01B11/0625 G01B11/0641

    Abstract: A substrate processing apparatus includes a chamber including an accommodation space, a stage disposed in the accommodation space and provided with a substrate disposed thereon, a deposition part disposed under the stage and spraying at least one deposition material to the substrate, and a measurement part disposed adjacent to the deposition part. The measurement part includes an accommodation portion provided with an opening defined through at least one surface thereof, a light source disposed in the accommodation portion and irradiating a first light, at least one transmission portion disposed in the opening, facing the light source, and receiving the first light, and a reception portion facing the at least one transmission portion and receiving the first light reflected from the at least one deposition material as a second light.

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