公开(公告)号：US20220037425A1

公开(公告)日：2022-02-03

申请号：US17195901

申请日：2021-03-09

Applicant: Samsung Display Co., Ltd.

Inventor： Sungbae JU

IPC: H01L27/32 ,  H01L51/52 ,  H01L51/56

Abstract: An organic light emitting display device includes: a substrate including: pixel regions; connection regions between adjacent pixel regions from among the pixel regions, respectively; and a region having a through-opening, the region being defined by the adjacent pixel regions, and the connection regions respectively between the adjacent pixel regions; a sub-pixel structure on the substrate at each of the pixel regions; and an organic pattern on a side wall of the substrate, the side wall being adjacent to the through-opening.

公开(公告)号：US20220216405A1

公开(公告)日：2022-07-07

申请号：US17703195

申请日：2022-03-24

Applicant: Samsung Display Co., Ltd.

Inventor： Inkyung YOO ,  SangJin PARK ,  Donghyun YANG ,  Sungbae JU

IPC: H01L51/00 ,  H01L51/56

Abstract: A method for manufacturing a mask includes providing a mask mother substrate including a first portion and a plurality of second portions adjacent to the first portion, forming a reflecting plate on the mask mother substrate, forming a photoresist layer on the reflecting plate, removing a third portion of the photoresist layer that overlaps the plurality of second portions using an auxiliary mask, removing a fourth portion of the reflecting plate that overlaps the plurality of second portions, and removing the plurality of second portions of the mask mother substrate using a laser.

公开(公告)号：US20200152872A1

公开(公告)日：2020-05-14

申请号：US16601490

申请日：2019-10-14

Applicant: Samsung Display Co., Ltd.

Inventor： Inkyung YOO ,  SangJin PARK ,  Donghyun YANG ,  Sungbae JU

IPC: H01L51/00 ,  H01L51/56

Abstract: A method for manufacturing a mask includes providing a mask mother substrate including a first portion and a plurality of second portions adjacent to the first portion, forming a reflecting plate on the mask mother substrate, forming a photoresist layer on the reflecting plate, removing a third portion of the photoresist layer that overlaps the plurality of second portions using an auxiliary mask, removing a fourth portion of the reflecting plate that overlaps the plurality of second portions, and removing the plurality of second portions of the mask mother substrate using a laser.