公开(公告)号：US09560696B2

公开(公告)日：2017-01-31

申请号：US14534432

申请日：2014-11-06

Applicant: Samsung Display Co., Ltd.

Inventor： Jae-Sik Kim ,  Hyun-Sung Bang ,  Sung-Soon Im ,  Ji-Young Choung ,  Kyu-Hwan Hwang

IPC: H05B3/00 ,  H01L27/12 ,  H01L51/00

CPC classification number: H05B3/0047 ,  H01L27/1262 ,  H01L27/1266 ,  H01L51/0013

Abstract: A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.

Abstract translation: 一种用于显示装置的热处理方法，包括在基板台上设置受主基板，在受主基板上设置包括转印层的图案掩模，将闪光束从多个闪光灯照射到图案掩模上，并将 转移层到受体底物。 多个闪光灯相对于受主基板对称设置，并且被配置为照射闪光束。

公开(公告)号：US20150372259A1

公开(公告)日：2015-12-24

申请号：US14534432

申请日：2014-11-06

Applicant: Samsung Display Co., Ltd.

Inventor： Jae-Sik Kim ,  Hyun-Sung Bang ,  Sung-Soon Im ,  Ji-Young Choung ,  Kyu-Hwan Hwang

IPC: H01L51/56 ,  H05B3/00 ,  H01L27/12

CPC classification number: H05B3/0047 ,  H01L27/1262 ,  H01L27/1266 ,  H01L51/0013

Abstract: A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.

Abstract translation: 一种用于显示装置的热处理方法，包括在基板台上设置受主基板，在受主基板上设置包括转印层的图案掩模，将闪光束从多个闪光灯照射到图案掩模上，并将 转移层到受体底物。 多个闪光灯相对于受主基板对称设置，并且被配置为照射闪光束。