公开(公告)号：US09389451B2

公开(公告)日：2016-07-12

申请号：US14173634

申请日：2014-02-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hoon Kang ,  Jae-Sung Kim ,  Jin-Young Choi ,  Koichi Sugitani ,  Ki-Hyun Cho ,  Jin Ho Ju ,  Byung-Uk Kim ,  Joo-Pyo Yun ,  Hyoc-Min Youn

IPC: C09K19/00 ,  G02F1/1333 ,  G03F7/004

CPC classification number: G02F1/133345 ,  G03F7/0045 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1077

Abstract: A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.

Abstract translation: 公开了一种感光性树脂组合物。 所公开的感光性树脂组合物包括通过使i）不饱和羧酸，不饱和羧酸酐或其混合物共聚形成的丙烯酸类共聚物，和ii）烯烃系不饱和化合物或其混合物，其中， 酚羟基被酸可降解的缩醛或缩酮基，光致酸发生剂和溶剂保护。

公开(公告)号：US20140327866A1

公开(公告)日：2014-11-06

申请号：US14173634

申请日：2014-02-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hoon Kang ,  Jae-Sung Kim ,  Jin-Young Choi ,  Koichi Sugitani ,  Ki-Hyun Cho ,  Jin Ho Ju ,  Byung-Uk Kim ,  Joo-Pyo Yun ,  Hyoc-Min Youn

IPC: G03F7/038 ,  G02F1/1333

CPC classification number: G02F1/133345 ,  G03F7/0045 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1077

Abstract: A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.

Abstract translation: 公开了一种感光性树脂组合物。 所公开的感光性树脂组合物包括通过使i）不饱和羧酸，不饱和羧酸酐或其混合物共聚形成的丙烯酸类共聚物，和ii）烯烃系不饱和化合物或其混合物，其中， 酚羟基被酸可降解的缩醛或缩酮基，光致酸发生剂和溶剂保护。