DEPOSITION MASK AND METHOD OF MANUFACTURING THE DEPOSITION MASK

    公开(公告)号:US20220267888A1

    公开(公告)日:2022-08-25

    申请号:US17742355

    申请日:2022-05-11

    Abstract: A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.

    DEPOSITION MASK AND METHOD OF MANUFACTURING THE DEPOSITION MASK

    公开(公告)号:US20200208249A1

    公开(公告)日:2020-07-02

    申请号:US16674997

    申请日:2019-11-05

    Abstract: A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.

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