Abstract:
A method for manufacturing a flexible display device includes forming a separation layer on a carrier substrate, laminating a flexible substrate having an area that is larger than an area of the separation layer, to the separation layer; forming a dummy pattern on and along an edge of the flexible substrate; exposing a portion of the separation layer by removing a portion of the flexible substrate at a side of the flexible substrate; and separating the separation layer and the flexible substrate from each other.
Abstract:
A touch display panel including a thin-film transistor substrate including a thin-film transistor, a pixel defining layer disposed on the thin-film transistor substrate and including a first opening, a light emitting structure disposed in the first opening, a thin film encapsulation layer covering the light emitting structure and the pixel defining layer, a first metal pattern disposed on the thin film encapsulation layer, a first insulation pattern disposed on the first metal pattern and having the same shape as the first metal pattern in a plan view, a second metal pattern disposed on the first insulation pattern, and a second insulation layer disposed on the second metal pattern and the thin film encapsulation layer and covering the first metal pattern, the first insulation pattern and the second metal pattern.
Abstract:
A mother panel for a display panel includes a first mother substrate and a second mother substrate that are spaced apart from each other to face each other, each of which includes at least one usable area that is usable as the display panel, and at least one unusable area that surrounds the usable area. The mother panel also includes a plurality of display panel patterns between the first mother substrate and the second mother substrate that are spaced apart from one another in the usable area, a seal pattern that adheres the first mother substrate with the second mother substrate and seals each of the plurality of display panel patterns, and an etching stopping unit that prevents an etchant from permeating between the first mother substrate and the second mother substrate and prevents a boundary area of an etching target surface from being etched.