PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME
    1.
    发明申请
    PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME 有权
    光电组合物及使用其制造显示装置的方法

    公开(公告)号:US20140242515A1

    公开(公告)日:2014-08-28

    申请号:US13961458

    申请日:2013-08-07

    Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

    Abstract translation: 一种光致抗蚀剂组合物,其包含粘合剂树脂,其包含由化学式1表示的酚醛清漆树脂,二叠氮基感光引发剂和包含碱溶剂和辅助溶剂的溶剂,其中所述基础溶剂包括丙二醇单甲醚乙酸酯,并且所述辅助溶剂包括 二甲基-2-甲基戊二酸酯和β-乙氧基丙酸乙酯,其中在化学式1中,R 1至R 9各自独立地为氢原子或烷基,“a”为0至10的整数,“b”为整数 从0到100,“c”是从1到10的整数。

    DISPLAY DEVICE
    2.
    发明申请

    公开(公告)号:US20250072263A1

    公开(公告)日:2025-02-27

    申请号:US18618967

    申请日:2024-03-27

    Abstract: A display device includes: a support substrate including a main area including a display area in which light emitting areas are arranged, a hole area surrounded by the main area, and a hole peripheral area between the hole area and the main area; a circuit layer on the support substrate; an element layer on the circuit layer; a capping layer on the element layer; an encapsulation substrate on the capping layer and bonded to the support substrate; a first hole peripheral dam in the hole peripheral area and surrounding a periphery of the hole area; a second hole peripheral dam in the hole peripheral area and surrounding a periphery of the first hole peripheral dam; and an auxiliary dam in a valley area of the hole peripheral area between the first hole peripheral dam and the second hole peripheral dam.

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