公开(公告)号：US20230381832A1

公开(公告)日：2023-11-30

申请号：US18112716

申请日：2023-02-22

Applicant: Samsung Display Co., LTD.

Inventor： Jai Phoong KIM ,  Jae Hoon LEE ,  Hyuk KANG ,  Chang Uk AN ,  Han Geul LIM ,  Byung Jin CHOI

IPC: B08B3/12

CPC classification number: B08B3/12 ,  B08B2203/007

Abstract: A mask cleaning apparatus includes a cleaning bath including an accommodating space in which a cleaning solution is stored, a transfer robot transferring a mask, and an induction heating member disposed inside the accommodating space. The cleaning bath includes at least one side and a bottom surface, which define the accommodating space. The induction heating member includes a first heating member, a second heating member, and a waterproof layer covering the first heating member and the second heating member.

公开(公告)号：US20220219208A1

公开(公告)日：2022-07-14

申请号：US17477038

申请日：2021-09-16

Applicant: Samsung Display Co., LTD.

Inventor： Jai Phoong KIM ,  Hyuk KANG ,  Chang Uk AN ,  Jae Min HONG

IPC: B08B3/08 ,  B08B3/04 ,  B08B3/14 ,  H01L51/56 ,  H01L51/00

Abstract: Provided are a deposition mask cleaning apparatus and a deposition mask cleaning method. The deposition mask cleaning apparatus includes a treated water bath containing treated water in which a deposition mask is immersed; a treated water generation part supplying the treated water to the treated water bath; a treated water supply pipe connecting the treated water bath and the treated water generation part; and a bubble generation part disposed in the treated water supply pipe and generating bubbles in the treated water. The treated water includes at least one of ozone water, hydrogen water, ammonia hydrogen water, and carbonated water. The bubbles include at least one of microbubbles having a bubble diameter of about 50 μm or less and nanobubbles having a bubble diameter of about 1 μm or less.