公开(公告)号：US20010050372A1

公开(公告)日：2001-12-13

申请号：US09902221

申请日：2001-07-10

Applicant: U.S. Philips Corporation

Inventor： Marcellinus P.C.M. Krijn ,  Marinus J.J. Dona ,  Johannes M.M. Swinkels ,  Jeroen J.M. Vleggaar

IPC: H01L033/00

CPC classification number: H01L51/52 ,  B32B17/10018 ,  B32B17/10055 ,  C03C17/32 ,  G02F1/133305 ,  G02F2001/133374

Abstract: The invention relates to a substrate comprising a glass sheet (1) having a thickness which is smaller than or equal to 0.1 mm, the glass sheet (1) being provided with a layer of a synthetic resin material (2) having a thickness which is smaller than or equal to that of the glass sheet (1). This substrate proves to be flexible. In addition, the substrate cracks less easily, so that it can be processed more readily. The substrate may be used, for example, in light-emitting devices, such as a poly-LED or PALC.

Abstract translation: 本发明涉及一种包括厚度小于或等于0.1mm的玻璃板（1）的基板，所述玻璃板（1）设置有合成树脂材料层（2），所述合成树脂材料层的厚度为 小于或等于玻璃板（1）的厚度。 这种底物被证明是灵活的。 此外，基板不容易裂纹，从而可以更容易地加工。 衬底可以用于例如诸如多LED或PALC的发光器件中。

公开(公告)号：US20010023926A1

公开(公告)日：2001-09-27

申请号：US09824620

申请日：2001-04-02

Applicant: PHILIPS CORPORATION

Inventor： Marcellinus P.C.M. Krijn

IPC: G21K001/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3175 ,  H01J2237/04928 ,  H01J2237/31788

Abstract: According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over. The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.

Abstract translation: 根据已知的投影光刻方法，通过旋转对称电子透镜的伸缩系统将物体成像在成像表面上。 通过投影光刻生产集成电路期间的吞吐量由成像电子束中的电流量决定; 该电流受限于电子的分辨率限制相互作用（库仑相互作用）。 在避免具有高电流浓度的区域中，本发明允许较大的束流。 为此，成像系统包括五个相互垂直的四极，使得电子集中在线状焦点而不是（小）圆形交叉。 该系统是可伸缩的，成像在x-z平面和y-z平面上具有相同的放大倍数。