公开(公告)号：US10311198B2

公开(公告)日：2019-06-04

申请号：US15119306

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Tal Verdene ,  Michal Yachini ,  Dror Shafir ,  Changman Moon ,  Shay Wolfling

IPC: G06F17/50 ,  G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L29/66

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.