SEMICONDUCTOR STRUCTURE WITH SPARE CELL REGION
    1.
    发明申请
    SEMICONDUCTOR STRUCTURE WITH SPARE CELL REGION 审中-公开
    具有细胞区域的半导体结构

    公开(公告)号:US20160020199A1

    公开(公告)日:2016-01-21

    申请号:US14331233

    申请日:2014-07-15

    Applicant: Mediatek Inc.

    CPC classification number: H03K19/0016 H01L27/0207 H01L27/11807 H03K19/1735

    Abstract: A semiconductor structure includes a first spare cell region, a first conductive line and a second conductive line. The first spare cell region has a plurality of spare cells. The first conductive line is coupled between a first reference voltage and the plurality of spare cells, and is arranged for providing the first reference voltage to the plurality of spare cells of the first spare cell region. The second conductive line is coupled to a plurality of spare cells, and is arranged for providing a second reference voltage to the plurality of spare cells of the first spare cell region.

    Abstract translation: 半导体结构包括第一备用单元区域,第一导电线路和第二导电线路。 第一备用单元区域具有多个备用单元。 第一导线耦合在第一参考电压和多个备用单元之间,并且被布置为将第一参考电压提供给第一备用单元区域的多个备用单元。 第二导线被耦合到多个备用单元,并且被布置用于向第一备用单元区域的多个备用单元提供第二参考电压。

Patent Agency Ranking