Method of fabricating a refractive silicon microlens
    1.
    发明申请
    Method of fabricating a refractive silicon microlens 失效
    制造折射硅微透镜的方法

    公开(公告)号:US20010015342A1

    公开(公告)日:2001-08-23

    申请号:US09750135

    申请日:2000-12-29

    CPC classification number: G02B3/0056 G02B3/0012

    Abstract: A method of fabricating a refractive silicon microlens by using micro-machining technology. The method of fabricating a refractive silicon microlens according to the present invention comprises the steps of forming a boron-doped region on a silicon substrate, and selectively removing regions of the substrate except for the boron-doped region to form a lens comprised of only the boron-doped region. With the method of the present invention, it is possible to fabricate a two-dimensional infrared silicon microlens array. By using such a two-dimensional infrared silicon microlens array in an infrared sensor, the detectivity of the infrared sensor can be increased by 3.4 times, which is the refraction index of silicon. In addition, the two-dimensional infrared silicon microlens array of the present invention can be used with commercial infrared telecommunication devices.

    Abstract translation: 使用微加工技术制造折射硅微透镜的方法。 根据本发明的制造折射硅微透镜的方法包括以下步骤:在硅衬底上形成硼掺杂区域,并且选择性去除除了掺杂硼的区域之外的衬底的区域以形成仅由 硼掺杂区域。 利用本发明的方法,可以制造二维红外硅微透镜阵列。 通过在红外线传感器中使用这种二维红外硅微透镜阵列,红外传感器的检测能力可以提高3.4倍,这是硅的折射率。 此外,本发明的二维红外硅微透镜阵列可以与商业红外线通信设备一起使用。

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