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公开(公告)号：US20230257314A1
公开(公告)日：2023-08-17
申请号：US17980287
申请日：2022-11-03
Inventor： Sung min LEE , Yoon Suk OH , Hyeong Jun KIM , Gyusang OH
CPC classification number: C04B41/522 , C04B35/10 , C04B41/5045 , C04B41/5055 , C04B41/4543 , C04B41/4558 , C04B41/0072 , C04B41/87 , C23C4/11 , C04B2235/3217 , C04B2235/9669
Abstract: The present invention provides a plasma-resistant ceramic member, which includes a substrate and a ceramic coating layer formed on the substrate, in which the ceramic coating layer includes a lower layer consisting of an oxide formed on the substrate, and a surface layer in which an oxide composition component constituting the surface of the ceramic coating layer is surface-modified with a composition containing one or more anions selected from the group consisting of F− and Cl−, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F− and Cl− is vaporized by heating and adsorbed to the surface of the ceramic coating layer, and thus modified with a composition containing one or more anions selected from the group consisting of F− and Cl−, and a method of manufacturing the same. According to the present invention, the plasma-resistant property, durability, and etching process stability of the ceramic member may be improved with low costs.
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公开(公告)号：US20240043338A1
公开(公告)日：2024-02-08
申请号：US18268879
申请日：2021-12-02
Inventor： Sung Min LEE , Yoon Suk OH , Hyeong Jun KIM , Gyusang OH
CPC classification number: C04B35/44 , C04B41/81 , C04B35/48 , C04B2235/963
Abstract: The present invention provides a plasma-resistant ceramic substrate including a bulk of an oxide composition; and a surface layer in which an oxide composition component constituting the bulk was modified to a composition including one or more anions selected from the group consisting of F− and Cl−, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F− and Cl− is vaporized by heating and adsorbed on the surface of the ceramic substrate to be modified to a composition including one or more anions selected from the group consisting of F− and Cl−, and a method of manufacturing the same. According to the present invention, the plasma resistance and durability of the ceramic substrate can be improved at low cost.
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公开(公告)号：US20230406755A1
公开(公告)日：2023-12-21
申请号：US18248312
申请日：2021-10-05
Inventor： Dae Gean KIM , Hye Won SEOK , Hyeong Jun KIM
IPC: C03C3/112
CPC classification number: C03C3/112 , C03C2203/10
Abstract: An embodiment of the present invention relates to a plasma-resistant glass, and a manufacturing method therefor, and the present invention is intended to provide a plasma-resistant glass having improved plasma resistance properties, and a manufacturing method therefor. To this end, the present invention provides a plasma-resistant glass including SiO2 in an amount of 40 to 75 mol %, Al2O3 in an amount of 5 to 20 mol %, MgO in an amount of 10 to 40 mol %, and MgF2 in an amount of 0.01 to 10 mol %, and a manufacturing method therefor.
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公开(公告)号：US20230043972A1
公开(公告)日：2023-02-09
申请号：US17787888
申请日：2020-11-19
Inventor： Dae Gean KIM , Hye Won SEOK , Mun Ki LEE , Hyeong Jun KIM
Abstract: The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.
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