Plasma based light source having a target material coated on a cylindrically-symmetric element

    公开(公告)号:US09918375B2

    公开(公告)日:2018-03-13

    申请号:US15268793

    申请日:2016-09-19

    CPC classification number: H05G2/008 G02F1/0327 G02F2203/26

    Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cylindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cylindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

    Apparatus and methods for optics protection from debris in plasma-based light source

    公开(公告)号:US10101664B2

    公开(公告)日:2018-10-16

    申请号:US14739305

    申请日:2015-06-15

    Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

    Plasma Based Light Source Having a Target Material Coated on a Cylindrically-Symmetric Element

    公开(公告)号:US20170142818A1

    公开(公告)日:2017-05-18

    申请号:US15268793

    申请日:2016-09-19

    CPC classification number: H05G2/008 G02F1/0327 G02F2203/26

    Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cylindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cylindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

    APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE
    4.
    发明申请
    APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE 审中-公开
    用于基于等离子体光源的DEBRIS的光学保护的装置和方法

    公开(公告)号:US20160128171A1

    公开(公告)日:2016-05-05

    申请号:US14739305

    申请日:2015-06-15

    CPC classification number: G03F7/70033 G03F7/70916 G03F7/70933

    Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

    Abstract translation: 公开了用于产生照明光束的方法和装置。 在一个实施例中,该设备包括被配置为保持目标材料的真空室,定位在真空室内的光学元件或者在该真空室的壁内的真空室,以及用于产生至少一个激发源的照明源系统 真空室中的目标,用于在真空室中产生等离子体,以产生照射辐射。 该装置还包括用于使气体从多个喷嘴流出并以等离子体的速度远离光学元件的碎屑保护系统,以防止碎片到达这种光学元件。

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