公开(公告)号：US09952140B2

公开(公告)日：2018-04-24

申请号：US13903070

申请日：2013-05-28

Applicant: KLA-Tencor Corporation

Inventor： Haiming Wang ,  Shankar Krishnan

IPC: G01J4/00 ,  G01N21/21 ,  G03F7/20

CPC classification number: G01N21/211 ,  G03F7/70625

Abstract: Methods and systems for small angle CD metrology with a small spot size are introduced to increase measurement sensitivity while maintaining adequate throughput necessary for modern semiconductor manufacture. A small angle CD metrology system includes a small angle spectroscopic ellipsometry (SE) subsystem combined with a small angle spectroscopic reflectometry system, both operated at small angles of incidence. The small angle SE subsystem is configured to operate in a complete Mueller Matrix mode to further improve measurement sensitivity. The small angle CD metrology system includes an objective having all reflective surfaces in the light path. In some embodiments, the all-reflective objective is a Schwartzschild objective having an axicon mirror element to further reduce measurement spot size. In some embodiments, the small angle CD metrology system includes a dynamic aperture subsystem to isolate specific ranges of angles of incidence and azimuth for improved measurement sensitivity.

公开(公告)号：US20130321810A1

公开(公告)日：2013-12-05

申请号：US13903070

申请日：2013-05-28

Applicant: KLA-Tencor Corporation

Inventor： Haiming Wang ,  Shankar Krishnan

IPC: G01N21/21

CPC classification number: G01N21/211 ,  G03F7/70625

Abstract: Methods and systems for small angle CD metrology with a small spot size are introduced to increase measurement sensitivity while maintaining adequate throughput necessary for modern semiconductor manufacture. A small angle CD metrology system includes a small angle spectroscopic ellipsometry (SE) subsystem combined with a small angle spectroscopic reflectometry system, both operated at small angles of incidence. The small angle SE subsystem is configured to operate in a complete Mueller Matrix mode to further improve measurement sensitivity. The small angle CD metrology system includes an objective having all reflective surfaces in the light path. In some embodiments, the all-reflective objective is a Schwartzschild objective having an axicon mirror element to further reduce measurement spot size. In some embodiments, the small angle CD metrology system includes a dynamic aperture subsystem to isolate specific ranges of angles of incidence and azimuth for improved measurement sensitivity.

Abstract translation: 引入了具有小光斑尺寸的小角度CD测量方法和系统，以提高测量灵敏度，同时保持现代半导体制造所需的足够的通量。 小角度CD测量系统包括小角度光谱椭偏仪（SE）子系统和小角度光谱反射测量系统，两者均以小的入射角进行操作。 小角度SE子系统配置为在完整的Mueller矩阵模式下工作，以进一步提高测量灵敏度。 小角度CD测量系统包括在光路中具有所有反射表面的物镜。 在一些实施例中，全反射目标是具有用于进一步减小测量光斑尺寸的旋转镜镜元件的Schwartzschild物镜。 在一些实施例中，小角度CD测量系统包括动态孔径子系统以隔离入射角和方位角的特定范围，以提高测量灵敏度。