公开(公告)号：US09918375B2

公开(公告)日：2018-03-13

申请号：US15268793

申请日：2016-09-19

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin

IPC: H05G2/00 ,  G03F7/20 ,  G02F1/03

CPC classification number: H05G2/008 ,  G02F1/0327 ,  G02F2203/26

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cylindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cylindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

公开(公告)号：US20160249442A1

公开(公告)日：2016-08-25

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/003 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/008

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

Abstract translation: 本公开涉及基于等离子体的光源。 描述了用于保护光源的组分的等离子体产生的碎片的系统和方法，其可以包括目标材料气体，原子蒸汽，高能离子，中性粒子，微粒子和污染物。 具体实施方案包括用于减少等离子体产生的离子和中性物质对光源组分的不利影响的装置，同时减少由于目标材料气体和蒸汽引起的带内光衰减。

公开(公告)号：US20140306115A1

公开(公告)日：2014-10-16

申请号：US14247082

申请日：2014-04-07

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Oleg Khodykin

IPC: G02B27/00 ,  G01N23/20 ,  H05G2/00

CPC classification number: G02B27/0006 ,  G01N2223/204 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: The present disclosure is directed to a system for protecting a reflective optic and/or any other surface in a plasma-based illumination system from debris by actively flowing gas against the debris flow direction. According to various embodiments, a vacuum chamber is configured to contain a target material, wherein a laser or discharge produced plasma is generated in response to an excitation of the target material. One or more outlets within the chamber are configured to receive gas flowing from a fluidically coupled gas source and further configured to actively flow the gas towards a source of debris and away from the reflective optic or any other protected surface at a controlled flow rate.

Abstract translation: 本公开涉及一种用于通过主动地流动气体抵抗碎屑流动方向来保护基于等离子体的照明系统中的反射光学器件和/或任何其它表面免受碎片的系统。 根据各种实施例，真空室被配置为容纳目标材料，其中响应于目标材料的激发产生激光或放电产生的等离子体。 腔室内的一个或多个出口构造成接收从流体耦合的气体源流动的气体，并进一步配置成主动地将气体朝向碎屑源流动，并以受控流速远离反射光学元件或任何其它受保护的表面。

公开(公告)号：US20170142818A1

公开(公告)日：2017-05-18

申请号：US15268793

申请日：2016-09-19

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin

IPC: H05G2/00 ,  G02F1/03

CPC classification number: H05G2/008 ,  G02F1/0327 ,  G02F2203/26

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cylindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cylindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

公开(公告)号：US20170142817A1

公开(公告)日：2017-05-18

申请号：US15265515

申请日：2016-09-14

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US10034362B2

公开(公告)日：2018-07-24

申请号：US14838594

申请日：2015-08-28

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

IPC: H05G2/00 ,  G03F7/20

Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

公开(公告)号：US10021773B2

公开(公告)日：2018-07-10

申请号：US15265515

申请日：2016-09-14

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US20160128171A1

公开(公告)日：2016-05-05

申请号：US14739305

申请日：2015-06-15

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin ,  Michael P. Kanouff

IPC: H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  G03F7/70933

Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

Abstract translation: 公开了用于产生照明光束的方法和装置。 在一个实施例中，该设备包括被配置为保持目标材料的真空室，定位在真空室内的光学元件或者在该真空室的壁内的真空室，以及用于产生至少一个激发源的照明源系统 真空室中的目标，用于在真空室中产生等离子体，以产生照射辐射。 该装置还包括用于使气体从多个喷嘴流出并以等离子体的速度远离光学元件的碎屑保护系统，以防止碎片到达这种光学元件。

公开(公告)号：US10893599B2

公开(公告)日：2021-01-12

申请号：US16030693

申请日：2018-07-09

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

公开(公告)号：US20190075641A1

公开(公告)日：2019-03-07

申请号：US16030693

申请日：2018-07-09

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Brian Ahr ,  Rudy F. Garcia ,  Frank Chilese ,  Oleg Khodykin

IPC: H05G2/00

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.