公开(公告)号：US20210333788A1

公开(公告)日：2021-10-28

申请号：US17366586

申请日：2021-07-02

Applicant: Gigaphoton Inc.

Inventor： Kunihiko ABE ,  Yuji MINEGISHI ,  Satoru KIKUCHI ,  Osamu WAKABAYASHI

IPC: G05B23/02 ,  G06N20/00 ,  G06N3/02

Abstract: A machine learning method according to a viewpoint of the present disclosure is a machine learning method for creating a learning model configured to estimate the life of a consumable of a laser apparatus, the method including acquiring first life-related information containing data on a parameter relating to the life of the consumable, the data recorded in correspondence with different numbers of oscillation pulses during a period from the start of use of the consumable to replacement thereof, dividing the first life-related information into a plurality of levels each representing the degree of degradation of the consumable in accordance with the numbers of oscillation pulses to create training data, creating the learning model by performing machine learning using the created training data, and saving the created learning model.

公开(公告)号：US20180196347A1

公开(公告)日：2018-07-12

申请号：US15914299

申请日：2018-03-07

Applicant: GIGAPHOTON INC.

Inventor： Yuji MINEGISHI ,  Yutaka IGARASHI ,  Takeshi OHTA

IPC: G03F7/20 ,  G06F21/62 ,  H01S3/00

CPC classification number: G03F7/70508 ,  G03F7/2002 ,  G03F7/70025 ,  G03F7/70483 ,  G03F7/70491 ,  G03F7/70575 ,  G03F7/70725 ,  G03F7/70775 ,  G06F21/62 ,  G06F2221/2141 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/225

Abstract: A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

公开(公告)号：US20240394762A1

公开(公告)日：2024-11-28

申请号：US18797560

申请日：2024-08-08

Applicant: Gigaphoton Inc.

Inventor： Yuji MINEGISHI

IPC: G06Q30/0283

Abstract: A residual pulse cost calculation method for a component of a light source which outputs a pulse laser beam includes, by a processor, acquiring first data in which the component of the light source and an operation pulse count of the component sequentially stored through an operation of the light source are associated with each other, acquiring second data in which the component and a standard guaranteed pulse count of the component are associated with each other, acquiring third data in which the light source and a pulse unit price of the light source are associated with each other, calculating a residual pulse count of the component from the operation pulse count and the standard guaranteed pulse count, calculating a residual pulse cost of the component from the residual pulse count and the pulse unit price, and outputting the residual pulse cost.

公开(公告)号：US20220342311A1

公开(公告)日：2022-10-27

申请号：US17858674

申请日：2022-07-06

Applicant: Gigaphoton Inc.

Inventor： Yutaka IGARASHI ,  Satoru KIKUCHI ,  Kunihiko ABE ,  Yuji MINEGISHI

IPC: G03F7/20 ,  H01S5/00

Abstract: An information processing device includes a processor and a storage device. The processor is configured to acquire data for each parameter provided from each of a light source device which generates pulse light and an exposure apparatus which performs exposure on a wafer with the pulse light output from the light source device, and time data associated with the data; to perform classification, based on the acquired data and time data, for each record of the data associated with same time data for distinguishing whether being data during exposure in which the wafer is irradiated with the pulse light or being data during non-exposure; to associate attribute information indicating an attribute according to the classification with each of the records; to cause the storage device to store the data and the time data associated with the attribute information; and to generate a chart using data read from the storage device.

公开(公告)号：US20240023217A1

公开(公告)日：2024-01-18

申请号：US18363381

申请日：2023-08-01

Applicant: Gigaphoton Inc.

Inventor： Yuji MINEGISHI ,  Osamu WAKABAYASHI

IPC: H05B45/50 ,  H05B47/17 ,  H05B47/19 ,  H05B47/105

CPC classification number: H05B45/50 ,  H05B47/17 ,  H05B47/19 ,  H05B47/105

Abstract: A light source parameter information management method for managing information on a parameter of a light source used in an exposure apparatus, the method including acquiring priority target parameter information containing an item of a variable that is a priority target parameter prioritized in the operation of the light source, and a target value of the variable, estimating maintenance information based on the priority target parameter information, the maintenance information containing a value representing the life of a consumable in the light source until maintenance of the consumable, and outputting the maintenance information.

公开(公告)号：US20210117931A1

公开(公告)日：2021-04-22

申请号：US17134944

申请日：2020-12-28

Applicant: Gigaphoton Inc.

Inventor： Kunihiko ABE ,  Yuji MINEGISHI ,  Osamu WAKABAYASHI

IPC: G06Q10/00 ,  G06Q50/04 ,  G06Q10/06 ,  G03F7/20

Abstract: A maintenance management method for a lithography system according to a viewpoint of the present disclosure includes organizing and saving operating information for each of lithography cells that are each an apparatus group formed of a set of apparatuses and form the lithography system, organizing and saving maintenance information on consumables for each of the lithography cells, calculating a standard maintenance timing for each of the consumables for each of the lithography cells based on the operating information and the maintenance information on the consumable for each of the lithography cells, creating a maintenance schedule plan for each of the lithography cells or for each of manufacturing lines based on the standard maintenance timing, information on a downtime, and information on a loss cost due to the downtime for each of the lithography cells or for each of the manufacturing lines, and outputting the result of the creation of the maintenance schedule plan.