公开(公告)号：USD849793S1

公开(公告)日：2019-05-28

申请号：US29629871

申请日：2017-12-15

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Designer： Hee Sook Shin ,  Youn-Hee Gil ,  Hee Kwon Kim ,  Cho-rong Yu ,  Jisu Lee

公开(公告)号：US09972492B2

公开(公告)日：2018-05-15

申请号：US15073455

申请日：2016-03-17

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Moon Youn Jung ,  Jisu Lee

IPC: H01L21/00 ,  H01L21/84 ,  H01L21/268 ,  H01L21/22 ,  H01L21/223 ,  H01L21/225 ,  H01L29/66

CPC classification number: H01L21/268 ,  H01L21/2225 ,  H01L21/223 ,  H01L21/2254 ,  H01L21/823814 ,  H01L29/66568

Abstract: Provided is a method of doping a substrate. The method includes providing the substrate, providing a target material on the substrate, and implanting a dopant of the target material into the substrate by providing a laser beam to the target material.