公开(公告)号：US10177014B2

公开(公告)日：2019-01-08

申请号：US14050196

申请日：2013-10-09

Applicant: Applied Materials, Inc.

Inventor： Govinda Raj ,  Daniel Martin ,  Robert T. Hirahara ,  Ashish Bhatnagar ,  Bopanna Vasanth ,  Prashanth Rao ,  Kadthala R. Narendrnath

IPC: H01L21/67 ,  H01L21/687 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306

Abstract: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface, a heating element disposed in the heater body between the first surface and the second surface, and a thermal barrier disposed on the second surface of the heater body, wherein the thermal barrier comprises a first layer and a second layer disposed on the first layer.

公开(公告)号：US09227297B2

公开(公告)日：2016-01-05

申请号：US14219913

申请日：2014-03-19

Applicant: Applied Materials, Inc.

Inventor： Irfanulla Khuddus Rahmathullah ,  Bopanna Ichettira Vansantha ,  Padma Gopalakrishnan ,  Abraham Palaty ,  Aswathnarayanaiah Ravi ,  Ashish Bhatnagar ,  Young J. Paik ,  Stacy Meyer ,  Daniel Martin

IPC: B24B37/30 ,  B24B37/32

CPC classification number: B24B37/32

Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.

Abstract translation: 保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。