公开(公告)号：US20230241731A1

公开(公告)日：2023-08-03

申请号：US17592400

申请日：2022-02-03

Applicant: Applied Materials, Inc.

Inventor： Arvinder CHADHA ,  Tomoaki KOHZU

IPC: B23Q3/15 ,  B23B31/28 ,  H01L21/683

CPC classification number: B23Q3/15 ,  B23B31/28 ,  H01L21/6833

Abstract: Electrostatic chucks and method for forming the same are described herein. The electrostatic chucks include a backside gas passage having a ceramic porous plug secured therein by a ceramic body of the chuck with a ceramic-to-ceramic body. In one example, ceramic porous plug is sintered with the ceramic body.

公开(公告)号：US20200264518A1

公开(公告)日：2020-08-20

申请号：US16276860

申请日：2019-02-15

Applicant: Applied Materials, Inc.

Inventor： Arvinder CHADHA

IPC: G03F7/20 ,  G03F7/213

Abstract: Embodiments described herein provide a method of large area lithography. One embodiment of the method includes projecting at least one incident beam to a mask in a propagation direction of the at least one incident beam. The mask having at least one period of a dispersive element that diffracts the incident beam into order mode beams having one or more diffraction orders with a highest order N greater than 1. The one or more diffraction orders provide an intensity pattern in a medium between the mask and a substrate having a photoresist layer disposed thereon. The intensity pattern includes a plurality of intensity peaks defined by sub-periodic patterns of the at least one period. The intensity peaks write a plurality of portions in the photoresist layer such that a number of the portions in the photoresist layer corresponding to the at least one period is greater than N.

公开(公告)号：US20240051075A1

公开(公告)日：2024-02-15

申请号：US18383430

申请日：2023-10-24

Applicant: Applied Materials, Inc.

Inventor： Arvinder CHADHA ,  Tomoaki KOHZU

IPC: B23Q3/15 ,  H01L21/683 ,  B23B31/28

CPC classification number: B23Q3/15 ,  H01L21/6833 ,  B23B31/28

Abstract: Electrostatic chucks and method for forming the same are described herein. The electrostatic chucks include a backside gas passage having a ceramic porous plug secured therein by a ceramic body of the chuck with a ceramic-to-ceramic body. In one example, ceramic porous plug is sintered with the ceramic body.

公开(公告)号：US20240248339A1

公开(公告)日：2024-07-25

申请号：US18438084

申请日：2024-02-09

Applicant: Applied Materials, Inc.

Inventor： Manivannan THOTHADRI ,  Harvey YOU ,  Helinda NOMINANDA ,  Neil MORRISON ,  Daniel Paul FORSTER ,  Arvinder CHADHA

IPC: G02F1/1333 ,  G02B1/11 ,  G02B1/14

CPC classification number: G02F1/133331 ,  G02B1/11 ,  G02B1/14 ,  G02F1/133305 ,  G02F2201/50 ,  G02F2202/28

Abstract: Embodiments described and discussed herein generally relate to flexible or foldable display devices, and more specifically to flexible cover lens assemblies. In one or more embodiments, a flexible cover lens assembly contains a glass layer, an adhesion promotion layer on the glass layer, an anti-reflectance layer disposed on the adhesion promotion layer, a dry hardcoat layer having a nano-indentation hardness in a range from about 1 GPa to about 5 GPa and disposed on the anti-reflectance layer, and an anti-fingerprint coating layer disposed on the dry hardcoat layer.

公开(公告)号：US20240184153A1

公开(公告)日：2024-06-06

申请号：US18437844

申请日：2024-02-09

Applicant: Applied Materials, Inc.

Inventor： Manivannan THOTHADRI ,  Harvey YOU ,  Helinda NOMINANDA ,  Neil MORRISON ,  Daniel Paul FORSTER ,  Arvinder CHADHA

IPC: G02F1/1333 ,  G02B1/11 ,  G02B1/14

CPC classification number: G02F1/133331 ,  G02B1/11 ,  G02B1/14 ,  G02F1/133305 ,  G02F2201/50 ,  G02F2202/28

Abstract: Embodiments described and discussed herein generally relate to flexible or foldable display devices, and more specifically to flexible cover lens assemblies. In one or more embodiments, a flexible cover lens assembly contains a glass layer, an adhesion promotion layer on the glass layer, an anti-reflectance layer disposed on the adhesion promotion layer, a dry hardcoat layer having a nano-indentation hardness in a range from about 1 GPa to about 5 GPa and disposed on the anti-reflectance layer, and an anti-fingerprint coating layer disposed on the dry hardcoat layer.

公开(公告)号：US20220121114A1

公开(公告)日：2022-04-21

申请号：US17428001

申请日：2020-02-09

Applicant: Applied Materials, Inc.

Inventor： Manivannan THOTHADRI ,  Kevin Laughton CUNNINGHAM ,  Arvinder CHADHA

IPC: G03F7/00 ,  B82Y40/00 ,  B29C59/02 ,  B29C35/02

Abstract: Embodiments of the present disclosure generally relate to pattern replication, imprint lithography, and more particularly to methods and apparatuses for creating a large area imprint without a seam. Methods disclosed herein generally include filling seams between pairs of masters with a filler material such that the seams are flush with a surface of the masters having a plurality of features disposed thereon.

公开(公告)号：US20190391448A1

公开(公告)日：2019-12-26

申请号：US16257379

申请日：2019-01-25

Applicant: Applied Materials, Inc.

Inventor： Manivannan THOTHADRI ,  Arvinder CHADHA

IPC: G02F1/1335 ,  G02B27/30 ,  G02B27/22 ,  H01L27/12 ,  H01L27/32

Abstract: Embodiments described herein relate to three dimensional (3D) display apparatus. In one embodiment, the 3D display apparatus include a polychromatic backlight unit comprising an emissive light source, a collimator comprising a plurality of collimating features coupled to and in optical communication with the backlight unit, and a diffractive element comprising a plurality of gratings coupled to and in optical communication with the collimator. In other embodiments, the 3D display apparatus includes a monochromatic backlight unit, an LCD module, and a quantum dot containing film.