公开(公告)号：US20220328285A1

公开(公告)日：2022-10-13

申请号：US17496427

申请日：2021-10-07

Applicant: Applied Materials, Inc.

Inventor： Abdullah ZAFAR ,  William John DURAND ,  Xinyuan CHONG ,  Kenric CHOI ,  Weize HU ,  Kelvin CHAN ,  Amir BAYATI ,  Michelle SANPEDRO ,  Philip A. KRAUS ,  Adolph Miller ALLEN

IPC: H01J37/32 ,  G01N21/3504 ,  G01N33/00 ,  C23C16/455 ,  C23C16/52

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.