公开(公告)号：US20220380502A1

公开(公告)日：2022-12-01

申请号：US17728865

申请日：2022-04-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F220/30 ,  C08F2/50

Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20230100712A1

公开(公告)日：2023-03-30

申请号：US17951885

申请日：2022-09-23

Applicant: Align Technology, Inc.

Inventor： Peter DORFINGER ,  Jennifer Marie CHAVEZ

IPC: A61C7/10 ,  A61C7/08 ,  C08L75/06

Abstract: The present disclosure provides multi-material orthodontic appliances useful for expanding a palate or arch of a patient, and, in some case, moving one or more teeth of the patient from a first to a second location according to a treatment plan. Further provided herein are methods for producing and using such multi-material orthodontic appliances on an individualized basis where each appliance is tailored to the specific treatment requirements of a patient.

公开(公告)号：US20250034305A1

公开(公告)日：2025-01-30

申请号：US18779695

申请日：2024-07-22

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Michael Christopher COLE ,  Jennifer Marie CHAVEZ

IPC: C08F220/12 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/50 ,  C08F220/30

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

公开(公告)号：US20250154305A1

公开(公告)日：2025-05-15

申请号：US19021547

申请日：2025-01-15

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F220/12 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/50 ,  C08F220/30

Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20240191006A1

公开(公告)日：2024-06-13

申请号：US18494569

申请日：2023-10-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F20/30 ,  A61C8/00 ,  B29C64/124 ,  B29K33/00 ,  B29K105/00 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F20/18

CPC classification number: C08F20/30 ,  A61C8/0016 ,  B33Y70/00 ,  B33Y80/00 ,  C08F20/18 ,  A61C2201/00 ,  B29C64/124 ,  B29K2033/08 ,  B29K2105/0002 ,  B33Y10/00

Abstract: The present disclosure provides curable compositions comprising one or more of photo-polymerizable monomers as reactive diluents, as well as polymeric materials formed from the curable compositions. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.