公开(公告)号：US09927717B2

公开(公告)日：2018-03-27

申请号：US15105517

申请日：2014-11-07

Applicant: ASML Netherlands B.V.

Inventor： Kyu Kab Rhe ,  David Deckers ,  Hubertus Johannes Gertrudus Simons ,  Thomas Theeuwes

IPC: G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method includes measuring an error in the image characteristic of the substrate, and determining a correction for a subsequent formation of the product features based upon the measured error and a characteristic of one or more of the product feature(s).