公开(公告)号：US10705438B2

公开(公告)日：2020-07-07

申请号：US16716568

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/62

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US20200117097A1

公开(公告)日：2020-04-16

申请号：US16716568

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/62

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US10571814B2

公开(公告)日：2020-02-25

申请号：US16318191

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/62 ,  G03F1/64

Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.